Microwave treatment of replicated optical structures

A method comprising:

• pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, wherein a plurality of nanoparticles are embedded in the replication material, at least a portion of the plurality of nanoparticles being nano-sized microwave susceptors, wherein the nano-sized microwave susceptors comprise silicon carbide (SiC);
• at least partially curing the replication material while the stamp is in contact with the replication material, wherein the at least partially curing the replication material does not include microwave radiation;
• after the at least partially curing the replication material, removing the stamp from contact with the replication material;
• and
• after removing the stamp from contact with the replication material, applying microwaves to the plurality of nanoparticles.

A method comprising:

• pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, wherein a plurality of nano-sized microwave susceptors are embedded in the replication material, and wherein the plurality of nano-sized microwave susceptors comprise silicon carbide (SiC) or yttria-stabilized zirconia (YSZ),
• wherein a plurality of optical nanoparticles are embedded in the replication material, the plurality of optical nanoparticles composed of a material different from the SiC or the YSZ of the plurality of nano-sized microwave susceptors, and
• wherein the plurality of nano-sized microwave susceptors have a smaller size than the plurality of optical nanoparticles;
• curing the replication material by applying microwaves to the replication material;
• and
• removing the face of the stamp from contact with the replication material.