US 7,199,393 B2Granted

Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same

AssigneeSamsung Electronics Co., Ltd.

InventorsJong Jin Park, Eun Joo Jang, Shin Ae Jun, Tae Kyung Ahn, Sung Hun Lee

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Abstract

Semiconductor nanocrystals surface-coordinated with a compound containing a photosensitive functional group, a photosensitive composition comprising semiconductor nanocrystals, and a method for forming semiconductor nanocrystal pattern by producing a film using the photosensitive semiconductor nanocrystals or the photosensitive composition, exposing the film to light and developing the exposed film, are provided. The semiconductor nanocrystal pattern exhibits luminescence characteristics comparable to the semiconductor nanocrystals before patterning and can be usefully applied to organic-inorganic hybrid electroluminescent devices.

Claims13

Dependent claims

A method for forming a semiconductor nanocrystal pattern on a substrate, comprising the steps of (a) coating a substrate with a dispersion of semiconductor nanocrystals selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and mixtures thereof in an organic solvent, wherein said semiconductor nanocrystals are surface-coordinated with a compound containing a photosensitive functional group represented by Formula 1 below:

X—A—B (1)
wherein X is NC—, HOOC—, HRN—, POOOH—, RS—or RSS—(in which R is a hydrogen atom or a C1-10 saturated or unsaturated aliphatic hydrocarbon group);
A is a direct bond, an aliphatic organic group, a phenylene group or a biphenylene group;
and B is an organic group containing at least one carbon-carbon double bond, which may be substituted with at least one group selected from the group consisting of—CN, —COOH, halogen groups, C1-5 halogenated alkyl groups, amine groups, C6-15 aromatic hydrocarbon groups, and C6-12 aromatic hydrocarbon groups substituted with F, CI, Br, a haloaenated alkyl group, R′O—(in which R′ is a hydrogen atom or a C1-5 alkyl group), —COOH, an amine group or —NO2;
(b) evaporating said organic solvent to form a nanoparticle film on said substrate of said semiconductor nanocrystals in combination with said surface-coordinated compound containing a photosensitive group;
(c) selectively exposing the film to light through a mask wherein a crosslinking reaction takes place resulting in a solubility difference between exposed and unexposed areas;
and (d) developing the exposed film with the use of an organic solvent, a weakly acid or basic solution, or water.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application: 10/814,264Filed 1 Apr 2004
Priority: KR 10-2003-007333821 Oct 2003
Published: US 2005/0161666 A128 Jul 2005
Granted: 3 Apr 2007
Term ends: Not estimatedThe source records don’t support an estimate.

Classification26 codes

C30B 29/60
Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape: characterised by shape
B82Y 20/00
Nanooptics
B82Y 30/00
Nanotechnology for materials or surface science
C08F 2/28
With the aid of emulsifying agents: cationic