Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting device

Abstract

A photosensitive resin composition including: (A) a glycidyl group-containing silicone resin; (B) a photocationic polymerization initiator; and (C) a polymer in which a quantum dot having a silane coupling agent coordinated is copolymerized with alkoxysilane, alkoxysilane hydrolysate, or condensate thereof. This can provide: a photosensitive resin composition capable of forming a film having high lithography resolution and favorable luminous properties; a photosensitive resin film obtained by using the photosensitive resin composition; patterning processes using these and a photosensitive dry film; and a light emitting device including a cured film obtained by using the photosensitive resin film.

Dependencies are inferred from the claim text.