G03F 7/0045
With organic non-macromolecular light-sensitive compounds not otherwise provided for
Official title: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
G03F7/0045 (With organic non-macromolecular light-sensitive compounds not otherwise provided for) appears on 3,917 US grants and 4,464 published applications in this corpus.
Search patents in G03F- Granted patents
- 3,917
- Published applications
- 4,464
- Assignees
- 538
- Inventors
- 4,576
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 4 | 0 |
| 1982 | 4 | 0 |
| 1983 | 6 | 0 |
| 1984 | 6 | 0 |
| 1985 | 5 | 0 |
| 1986 | 3 | 0 |
| 1987 | 7 | 0 |
| 1988 | 2 | 0 |
| 1989 | 10 | 0 |
| 1990 | 5 | 0 |
| 1991 | 20 | 0 |
| 1992 | 15 | 0 |
| 1993 | 28 | 0 |
| 1994 | 49 | 0 |
| 1995 | 24 | 0 |
| 1996 | 47 | 0 |
| 1997 | 76 | 0 |
| 1998 | 107 | 0 |
| 1999 | 114 | 0 |
| 2000 | 170 | 0 |
| 2001 | 144 | 65 |
| 2002 | 136 | 150 |
| 2003 | 130 | 156 |
| 2004 | 144 | 123 |
| 2005 | 85 | 120 |
| 2006 | 77 | 99 |
| 2007 | 105 | 103 |
| 2008 | 67 | 116 |
| 2009 | 89 | 143 |
| 2010 | 84 | 176 |
| 2011 | 108 | 171 |
| 2012 | 120 | 217 |
| 2013 | 142 | 203 |
| 2014 | 211 | 176 |
| 2015 | 235 | 165 |
| 2016 | 172 | 182 |
| 2017 | 148 | 188 |
| 2018 | 139 | 136 |
| 2019 | 112 | 164 |
| 2020 | 91 | 203 |
| 2021 | 97 | 215 |
| 2022 | 100 | 196 |
| 2023 | 156 | 246 |
| 2024 | 118 | 229 |
| 2025 | 112 | 261 |
| 2026 | 91 | 261 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photosensitive resin composition and display device including the same29 Sep 2026US 12,748,349 B2Samsung Display Co., Ltd.
- Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation method29 Sep 2026US 12,748,350 B2Shin-Etsu Chemical Co., Ltd.
- Compound, (co)polymer, composition, method for forming pattern, and method for producing compound15 Sep 2026US 12,735,382 B2Mitsubishi Gas Chemical Company, Inc.
- Resist composition and method for forming resist pattern15 Sep 2026US 12,736,875 B2Tokyo Ohka Kogyo.Co., Ltd.
- Semiconductor photoresist composition and method of forming patterns using the composition15 Sep 2026US 12,736,878 B2Samsung Electronics Co., Ltd.
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Photoresist compositions and patterning methods1 Oct 2026US 2026/0299406 A1
- Photoresist1 Oct 2026US 2026/0299408 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Photoactive compounds1 Oct 2026US 2026/0299409 A1Merck Patent GmbH
- Resist composition and resist pattern formation method1 Oct 2026US 2026/0299410 A1Tokyo Ohka Kogyo.Co., Ltd.
Most cited
By later US patents
- Arrays of materials attached to a substrate1,410US 5,744,305 AAffymetrix, Inc. · 1998
- Polymer and a forming method of a micro pattern using the same493US 6,225,020 B1Hyundai Electronics Industries Co., Ltd. · 2001
- Polymer and a forming method of a micro pattern using the same482US 6,316,162 B1Hyundai Electronics Industries Co., Ltd. · 2001
- Partially crosslinked polymer for bilayer photoresist479US 6,589,707 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Partially crosslinked polymer for bilayer photoresist471US 6,811,960 B2Hyundai Electronics Industries Co., Ltd. · 2004