G03F 1/86
By charged particle beam [cpb]
Official title: by charged particle beam [CPB]
G03F1/86 (By charged particle beam [cpb]) appears on 147 US grants and 152 published applications in this corpus.
Search patents in G03F- Granted patents
- 147
- Published applications
- 152
- Assignees
- 57
- Inventors
- 366
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 1 |
| 2002 | 1 | 7 |
| 2003 | 4 | 1 |
| 2004 | 1 | 2 |
| 2005 | 4 | 1 |
| 2006 | 2 | 2 |
| 2007 | 2 | 7 |
| 2008 | 3 | 8 |
| 2009 | 0 | 7 |
| 2010 | 4 | 7 |
| 2011 | 9 | 7 |
| 2012 | 8 | 6 |
| 2013 | 7 | 4 |
| 2014 | 4 | 3 |
| 2015 | 5 | 4 |
| 2016 | 9 | 3 |
| 2017 | 6 | 7 |
| 2018 | 8 | 8 |
| 2019 | 5 | 8 |
| 2020 | 7 | 16 |
| 2021 | 6 | 6 |
| 2022 | 14 | 11 |
| 2023 | 6 | 8 |
| 2024 | 6 | 5 |
| 2025 | 2 | 6 |
| 2026 | 6 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mask process correction methods and methods of fabricating lithographic masks using the same14 Jul 2026US 12,681,378 B2Samsung Electronics Co., Ltd.
- Method and apparatus for processing a lithographic mask7 Jul 2026US 12,675,042 B2Carl Zeiss SMT GmbH
- Mask process correction methods and methods of fabricating lithographic masks using the same26 May 2026US 12,638,765 B2Samsung Electronics Co., Ltd.
- Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method24 Feb 2026US 12,560,861 B2FUJIFILM Corporation
- Method and apparatus for setting a side wall angle of a pattern element of a photolithographic mask27 Jan 2026US 12,535,726 B2Carl Zeiss SMT GmbH
- Euv mask registration control method and euv mask manufacturing method including the control method1 Oct 2026US 2026/0299397 A1Samsung Electronics Co., Ltd.
- A pellicle cleaning system27 Aug 2026US 2026/0251987 A1ASML Netherlands B. V.
- Object table comprising an electrostatic clamp18 Jun 2026US 2026/0171932 A1ASML Netherlands B. V.
- Method of manufacturing semiconductor device21 May 2026US 2026/0140439 A1FUJIFILM Corporation
- Sample damage avoidance in devices and methods for sample processing and sample repair7 May 2026US 2026/0126720 A1
Most cited
By later US patents
- Pattern inspection apparatus and electron beam apparatus86US 5,430,292 AFujitsu Limited · 1995
- Apparatus and method of pattern detection based on a scanning transmission electron microscope52US 5,051,585 AHitachi, Ltd. · 1991
- Pattern inspection apparatus and electron beam apparatus40US 5,384,463 AFujisu Limited · 1995
- Circuit pattern inspecting device and method and circuit pattern arrangement suitable for the method35US 5,641,960 AFujitsu Limited · 1997
- Charged-particle-beam exposure device and charged-particle-beam exposure method30US 6,222,195 B1Fujitsu Limited · 2001