G03F 1/84
Inspecting
G03F1/84 (Inspecting) appears on 1,498 US grants and 1,582 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,498
- Published applications
- 1,582
- Assignees
- 307
- Inventors
- 2,677
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 3 | 0 |
| 1982 | 3 | 0 |
| 1983 | 2 | 0 |
| 1984 | 5 | 0 |
| 1985 | 2 | 0 |
| 1986 | 9 | 0 |
| 1987 | 3 | 0 |
| 1988 | 6 | 0 |
| 1989 | 6 | 0 |
| 1990 | 5 | 0 |
| 1991 | 5 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 6 | 0 |
| 1996 | 8 | 0 |
| 1997 | 8 | 0 |
| 1998 | 26 | 0 |
| 1999 | 13 | 0 |
| 2000 | 34 | 0 |
| 2001 | 18 | 14 |
| 2002 | 39 | 49 |
| 2003 | 43 | 53 |
| 2004 | 35 | 44 |
| 2005 | 41 | 54 |
| 2006 | 54 | 76 |
| 2007 | 45 | 81 |
| 2008 | 52 | 80 |
| 2009 | 59 | 71 |
| 2010 | 73 | 70 |
| 2011 | 69 | 61 |
| 2012 | 71 | 60 |
| 2013 | 47 | 50 |
| 2014 | 54 | 44 |
| 2015 | 52 | 54 |
| 2016 | 50 | 47 |
| 2017 | 64 | 52 |
| 2018 | 48 | 58 |
| 2019 | 49 | 67 |
| 2020 | 63 | 69 |
| 2021 | 61 | 70 |
| 2022 | 54 | 67 |
| 2023 | 61 | 82 |
| 2024 | 52 | 71 |
| 2025 | 43 | 76 |
| 2026 | 45 | 62 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Process proximity effect correction method and process proximity effect correction device25 Aug 2026US 12,717,225 B2Samsung Electronics Co., Ltd.
- Pellicle holding module, pellicle thermal durability evaluation device comprising same, and pellicle thermal durability evaluation method25 Aug 2026US 12,717,226 B2Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University)
- Mask inspection apparatus18 Aug 2026US 12,710,701 B2Stek Co., Ltd.
- Light source apparatus, inspection apparatus, exposure apparatus, light source control method, inspection method, and exposure method28 Jul 2026US 12,693,232 B2Lasertec Corporation
- Method and apparatus for characterization of a microlithography mask28 Jul 2026US 12,693,594 B2Carl Zeiss SMT GmbH
- Lithography focus control method8 Oct 2026US 2026/0310070 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Euv mask registration control method and euv mask manufacturing method including the control method1 Oct 2026US 2026/0299397 A1Samsung Electronics Co., Ltd.
- Euv reticle with charge dissipation structure1 Oct 2026US 2026/0299403 A1Intel Corporation
- Systems and methods for actinic mask inspection and review in vacuum1 Oct 2026US 2026/0299404 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and system to for rapid inspection of photolithography reticle1 Oct 2026US 2026/0299405 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Method and system for mask fabrication process control446US 7,260,442 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2007
- Method and system for context-specific mask inspection279US 7,231,628 B2Cadence Design Systems, Inc. · 2007
- Automated photomask inspection apparatus and method277US 5,563,702 AKLA Instruments Corporation · 1996
- Inspection technique of photomask263US 6,091,845 AMicron Technology, Inc. · 2000
- Optical system and method for angle-dependent reflection or transmission measurement255US 5,889,593 AKLA Instruments Corporation · 1999