Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method
AssigneeFUJIFILM Corporation
InventorsTetsuya Shimizu, Tsukasa Yamanaka, Yukihisa Kawada
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Abstract
A container for storing a chemical fluid for manufacturing an electronic material, in which after an inspection solution charges the container and stored at 25° C. for 30 days, a sum of a concentration of particulate metal including an iron atom, a concentration of particulate metal including a copper atom, and a concentration of particulate metal including a zinc atom which are measured by a Single Particle ICP-MASS method in the inspection solution is 100 ppt or less.
Claims12
A chemical fluid for manufacturing an electronic material which is stored in a container for storing a chemical fluid for manufacturing an electronic material,
- wherein after an inspection solution comprising the chemical fluid is charged into the container and stored at 25° C. for 30 days, a sum of a concentration of particulate metal including an iron atom, a concentration of particulate metal including a copper atom, and a concentration of particulate metal including a zinc atom which are measured by a Single Particle ICP-MASS method in the inspection solution is 100 ppt or less.
Dependencies are inferred from the claim text.