G03F 1/24
Reflection masks
Official title: Reflection masks; Preparation thereof
G03F1/24 (Reflection masks) appears on 1,179 US grants and 1,519 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,179
- Published applications
- 1,519
- Assignees
- 186
- Inventors
- 1,636
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 3 | 0 |
| 1995 | 2 | 0 |
| 1996 | 6 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 6 | 0 |
| 2000 | 7 | 0 |
| 2001 | 11 | 5 |
| 2002 | 14 | 19 |
| 2003 | 29 | 38 |
| 2004 | 29 | 44 |
| 2005 | 22 | 44 |
| 2006 | 39 | 42 |
| 2007 | 20 | 33 |
| 2008 | 18 | 37 |
| 2009 | 23 | 36 |
| 2010 | 39 | 35 |
| 2011 | 38 | 45 |
| 2012 | 36 | 50 |
| 2013 | 38 | 58 |
| 2014 | 49 | 71 |
| 2015 | 58 | 55 |
| 2016 | 76 | 64 |
| 2017 | 62 | 51 |
| 2018 | 43 | 44 |
| 2019 | 40 | 65 |
| 2020 | 47 | 81 |
| 2021 | 62 | 97 |
| 2022 | 91 | 122 |
| 2023 | 90 | 113 |
| 2024 | 87 | 118 |
| 2025 | 56 | 87 |
| 2026 | 31 | 65 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Reflective mask blank, reflective mask, reflective mask manufacturing method, and reflective mask correction method22 Sep 2026US 12,743,016 B2Tekscend Photomask Corp.
- Photomask for extreme ultraviolet1 Sep 2026US 12,724,341 B2LuminaMask Co., Ltd.
- Substrate for mask blanks and method for manufacturing the same11 Aug 2026US 12,704,776 B2Shin-Etsu Chemical Co., Ltd.
- Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device4 Aug 2026US 12,699,314 B2Hoya Corporation
- Photoresist composition14 Jul 2026US 12,681,384 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Euv photomask and manufacturing method thereof8 Oct 2026US 2026/0310060 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective mask blank, refelctive mask, and method for producing reflective mask8 Oct 2026US 2026/0310061 A1AGC Inc.
- Reflective mask blank, reflective mask, reflective mask blank producing method, and reflective mask producing method8 Oct 2026US 2026/0310066 A1AGC Inc.
- Euv mask registration control method and euv mask manufacturing method including the control method1 Oct 2026US 2026/0299397 A1Samsung Electronics Co., Ltd.
- Reflective photomask and method for manufacturing reflective photomask1 Oct 2026US 2026/0299398 A1Rapidus Corporation
Most cited
By later US patents
- Glass substrate-holding tool and method for producing an EUV mask blank by employing the same526US 8,967,608 B2Asahi Glass Company, Limited · 2015
- Glass substrate-holding tool525US 8,192,901 B2Asahi Glass Company, Limited · 2012
- Extreme ultraviolet lithography process and mask331US 8,841,047 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Reflective mask and method of making same330US 8,877,409 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof312US 8,764,995 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014