G01R 31/305
Using electron beams
Official title: using electron beams {(investigating or analysing materials by measuring photoelectric effect G01N23/227)}
G01R31/305 (Using electron beams) appears on 600 US grants and 374 published applications in this corpus.
Search patents in G01R- Granted patents
- 600
- Published applications
- 374
- Assignees
- 191
- Inventors
- 1,151
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 2 | 0 |
| 1980 | 3 | 0 |
| 1981 | 3 | 0 |
| 1982 | 4 | 0 |
| 1983 | 4 | 0 |
| 1984 | 5 | 0 |
| 1985 | 3 | 0 |
| 1986 | 7 | 0 |
| 1987 | 14 | 0 |
| 1988 | 17 | 0 |
| 1989 | 20 | 0 |
| 1990 | 11 | 0 |
| 1991 | 12 | 0 |
| 1992 | 15 | 0 |
| 1993 | 12 | 0 |
| 1994 | 7 | 0 |
| 1995 | 10 | 0 |
| 1996 | 13 | 0 |
| 1997 | 16 | 0 |
| 1998 | 14 | 0 |
| 1999 | 14 | 0 |
| 2000 | 10 | 0 |
| 2001 | 19 | 4 |
| 2002 | 16 | 13 |
| 2003 | 33 | 30 |
| 2004 | 21 | 19 |
| 2005 | 33 | 31 |
| 2006 | 26 | 30 |
| 2007 | 20 | 28 |
| 2008 | 28 | 24 |
| 2009 | 15 | 16 |
| 2010 | 20 | 10 |
| 2011 | 17 | 14 |
| 2012 | 9 | 8 |
| 2013 | 6 | 4 |
| 2014 | 11 | 6 |
| 2015 | 5 | 7 |
| 2016 | 10 | 9 |
| 2017 | 3 | 7 |
| 2018 | 5 | 8 |
| 2019 | 19 | 10 |
| 2020 | 12 | 9 |
| 2021 | 8 | 11 |
| 2022 | 11 | 9 |
| 2023 | 6 | 20 |
| 2024 | 9 | 14 |
| 2025 | 16 | 20 |
| 2026 | 5 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Wafer level electron beam prober5 May 2026US 12,618,900 B2Intel Corporation
- Structure and method for test-point access in a semiconductor5 May 2026US 12,622,229 B2NXP USA, Inc.
- Methods and techniques for determining when a probe tip is proximate to or in contact with a sample surface28 Apr 2026US 12,613,272 B2Xallent, LLC
- Technologies for verifying and validating electronic devices using electroluminescence17 Mar 2026US 12,578,383 B2Battelle Memorial Institute
- Sample inspection apparatus10 Feb 2026US 12,546,805 B2Hitachi High-Tech Corporation
- Voltage contrast for backside processes on wafers1 Oct 2026US 2026/0299019 A1Intel Corporation
- Method for testing a packaging substrate, and apparatus for testing a packaging substrate17 Sep 2026US 2026/0276702 A1
- Electron Beam Application Device and Time Constant Measurement Method27 Aug 2026US 2026/0251705 A1Hitachi High-Tech Corporation
- Wafer level electron beam prober13 Aug 2026US 2026/0235668 A1Intel Corporation
- Method for testing a packaging substrate, and apparatus for testing a packaging substrate13 Aug 2026US 2026/0235700 A1
Most cited
By later US patents
- Electron beam inspection system and method257US 5,502,306 AKLA Instruments Corporation · 1996
- Feature-based defect detection256US 6,539,106 B1APPLIED Materials.Inc. · 2003
- Multi-pixel methods and apparatus for analysis of defect information from test structures on semiconductor devices229US 6,771,806 B1KLA-Tencor Corporation · 2004
- Stepper type test structures and methods for inspection of semiconductor integrated circuits184US 6,633,174 B1KLA-Tencor Corporation · 2003
- Methods and systems for predicting IC chip yield182US 6,751,519 B1KLA-Tencor Technologies Corporation · 2004