C23C 16/45517
Confinement of gases to vicinity of substrate
Official title: {Confinement of gases to vicinity of substrate}
C23C16/45517 (Confinement of gases to vicinity of substrate) appears on 148 US grants and 188 published applications in this corpus.
Search patents in C23C- Granted patents
- 148
- Published applications
- 188
- Assignees
- 102
- Inventors
- 467
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 4 | 0 |
| 1994 | 3 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 1 |
| 2004 | 1 | 3 |
| 2005 | 0 | 2 |
| 2006 | 1 | 6 |
| 2007 | 0 | 3 |
| 2008 | 1 | 5 |
| 2009 | 0 | 2 |
| 2010 | 3 | 6 |
| 2011 | 3 | 8 |
| 2012 | 4 | 16 |
| 2013 | 4 | 5 |
| 2014 | 9 | 11 |
| 2015 | 9 | 9 |
| 2016 | 5 | 7 |
| 2017 | 6 | 6 |
| 2018 | 8 | 14 |
| 2019 | 10 | 5 |
| 2020 | 7 | 9 |
| 2021 | 8 | 5 |
| 2022 | 9 | 19 |
| 2023 | 4 | 18 |
| 2024 | 14 | 16 |
| 2025 | 12 | 7 |
| 2026 | 8 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate treatment method, substrate treatment apparatus, and computer storage medium8 Sep 2026US 12,733,422 B2Tokyo Electron Limited
- Minimization of chemical vapor infiltration tooling hole length through counterbores11 Aug 2026US 12,703,915 B2Rtx Corporation
- Substrate processing apparatus30 Jun 2026US 12,668,878 B2Kokusai Electric Corporation
- Method for coating metal2 Jun 2026US 12,644,177 B2Agc Glass Europe
- Method for producing a gallium oxide semiconductor film and a film forming apparatus14 Apr 2026US 12,601,054 B2Shin-Etsu Chemical Co., Ltd.
- Substrate processing method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus24 Sep 2026US 2026/0286522 A1Kokusai Electric Corporation
- Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium10 Sep 2026US 2026/0265916 A1Kokusai Electric Corporation
- Plenum driven hydroxyl combustion oxidation4 Jun 2026US 2026/0152851 A1APPLIED Materials.Inc.
- Process chamber volume adjustment7 May 2026US 2026/0125797 A1ASM IP Holding B. V.
- Organic electroluminescent devices30 Oct 2025US 2025/0333835 A1Universal Display Corporation
Most cited
By later US patents
- Method for a reactive surface treatment of a workpiece and a treatment chamber for practicing such method586US 5,422,139 ABalzers Aktiengesellschaft · 1995
- Vapor-phase process apparatus, vapor-phase process method, and substrate474US 8,349,083 B2Sumitomo Electric Industries, Ltd. · 2013
- Gaseous phase chemical treatment reactor432US 5,232,508 ACommissariat A L' Energie Atomique · 1993
- Surface treatment apparatus430US 4,693,211 ADainippon Screen Mfg.Co., Ltd. · 1987
- Deposition sub-chamber with variable flow426US 7,993,457 B1Novellus Systems, Inc. · 2011