Process chamber volume adjustment
AssigneeASM IP Holding B.V.
InventorsChristopher Falcone, Dinkar Nandwana, Kyle Fondurulia, Vishnu Shakti
Life of this patent
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Abstract
Methods and apparatuses for adjusting a process chamber volume are described. For example, a process chamber, after removing at least a component used to perform a function associated with the process chamber, may be installed with a fixture to adjust a volume of the process chamber. The process chamber with the fixture may reduce the amount of precursor gasses and processing time for coating a workpiece. The workpiece, after the coating, may be placed in another process chamber to perform a function associated with the other process chamber.
Claims20
An apparatus comprising:
- a process chamber configured to flow precursor gas through a chamber volume defined by inner walls of the process chamber;
- and
- a fixture positioned in the chamber volume, the fixture comprising:
- a bottom plate, and an annulus extending circumferentially around the bottom plate, wherein:
- the chamber volume is divided by the fixture into at least a first volume and a second volume;
- the first volume is defined by a first portion of the annulus, the bottom plate, and a first portion of the inner walls;
- the second volume is defined by a second portion of the annulus, the bottom plate, and a second portion of the inner walls;
- the first volume is configured to enclose a workpiece and is open to the precursor gas;
- and
- the second volume is sealed from the precursor gas.
A fixture for reducing a chamber volume through which precursor gas flow within a process chamber, the fixture comprising:
- an annulus comprising a cylindrical wall;
- and
- a bottom plate supported within the cylindrical wall, wherein the annulus is shaped to interface with internal walls of the process chamber such that, when installed in the chamber volume, the fixture forms a coating volume defined by an portion of the cylindrical wall, the bottom plate, and a portion of the internal walls, wherein the coating volume is smaller than the chamber volume and is open to flow of the precursor gas.
Dependencies are inferred from the claim text.