C23C 16/45506
Turbulent flow
Official title: {Turbulent flow}
C23C16/45506 (Turbulent flow) appears on 35 US grants and 37 published applications in this corpus.
Search patents in C23C- Granted patents
- 35
- Published applications
- 37
- Assignees
- 39
- Inventors
- 118
- Latest grant
- 14 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 2 |
| 2004 | 0 | 0 |
| 2005 | 1 | 1 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 9 |
| 2012 | 1 | 0 |
| 2013 | 4 | 4 |
| 2014 | 2 | 0 |
| 2015 | 2 | 1 |
| 2016 | 2 | 3 |
| 2017 | 1 | 2 |
| 2018 | 0 | 0 |
| 2019 | 1 | 3 |
| 2020 | 2 | 0 |
| 2021 | 1 | 1 |
| 2022 | 1 | 2 |
| 2023 | 0 | 0 |
| 2024 | 1 | 1 |
| 2025 | 0 | 1 |
| 2026 | 1 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium14 Apr 2026US 12,601,059 B2Kokusai Electric Corporation
- Method and apparatus for making a vapor of precise concentration by sublimation1 Oct 2024US 12,104,252 B2CeeVee Tech, LLC
- Apparatus for continuously producing carbon nanotubes17 May 2022US 11,332,372 B2Korea Institute of Science and Technology
- Multi-inlet gas distributor for chemical vapor deposition coating of TRISO particles6 Jul 2021US 11,053,589 B2X-energy, LLC
- Deposition device and deposition method27 Oct 2020US 10,815,567 B2Tokyo Electron Limited
- Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium10 Sep 2026US 2026/0265916 A1Kokusai Electric Corporation
- Flow adaptors for gas flows, and related processing chambers, processing systems, apparatus, and methods26 Mar 2026US 2026/0088256 A1APPLIED Materials.Inc.
- Disruptive flow protrusions to adjust flow, and related chamber kits, methods, and processing chambers29 Jan 2026US 2026/0028750 A1APPLIED Materials.Inc.
- Gas supply, processing apparatus, gas supply method, and method of manufacturing semiconductor device8 Jan 2026US 2026/0009129 A1Kokusai Electric Corporation
- Ceiling plate and epitaxial growth device having the same24 Apr 2025US 2025/0129510 A1Taiwan-Asia Semiconductor Corporation
Most cited
By later US patents
- Induction heated pancake epitaxial reactor616US 5,062,386 AEpitaxy Systems, Inc. · 1991
- Apparatus for chemical vapor deposition64US 4,062,318 ARCA Corporation · 1977
- Method for chemical vapor deposition31US 4,082,865 ARCA Corporation · 1978
- Process and apparatus for forming thin films25US 4,689,247 AAmetek, Inc. · 1987
- Method for vapor phase growth20US 5,755,878 AShin-Etsu Handotai Co., Ltd. · 1998