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US 2026/0009129 A1Published application
Gas supply, processing apparatus, gas supply method, and method of manufacturing semiconductor device
AssigneeKokusai Electric Corporation
InventorsYusaku OKAJIMA, Mika URUSHIHARA, Taketoshi MORIYA
Life of this patent
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Abstract
A gas supply includes: a flow path in which a gas flows; a plurality of openings respectively provided in a direction intersecting the flow path to supply the gas into a processing chamber, and a flow modifier provided to block a portion of the flow path, and configured to perturb flow of the gas flowing in the flow path toward the plurality of openings.
Claims20
A gas supply comprising:
- a flow path in which a gas flows;
- a plurality of openings respectively provided in a direction intersecting the flow path to supply the gas into a processing chamber;
- and
- a flow modifier provided to block a portion of the flow path and configured to perturb flow of the gas flowing in the flow path toward the plurality of openings.
1 more element
A processing apparatus comprising a gas supply which includes:
- a flow path in which a gas flows;
- a plurality of openings respectively provided in a direction intersecting the flow path to supply the gas into a processing chamber;
- and
- a flow modifier provided to block a portion of the flow path, to be configured to perturb flow of the gas flowing in the flow path toward the plurality of openings.
1 more element
A gas supply method, in which a gas is supplied by a gas supply including:
- a flow path in which a gas flows;
- a plurality of openings respectively provided in a direction intersecting the flow path to supply the gas into a processing chamber;
- and
- a flow modifier provided to block a portion of the flow path, to be configured to perturb flow of the gas flowing in the flow path toward the plurality of openings.
1 more element
Dependencies are inferred from the claim text.