C23C 16/20
Deposition of aluminium only
C23C16/20 (Deposition of aluminium only) appears on 109 US grants and 63 published applications in this corpus.
Search patents in C23C- Granted patents
- 109
- Published applications
- 63
- Assignees
- 65
- Inventors
- 255
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 4 | 0 |
| 1991 | 1 | 0 |
| 1992 | 6 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 3 | 0 |
| 1996 | 4 | 0 |
| 1997 | 3 | 0 |
| 1998 | 6 | 0 |
| 1999 | 9 | 0 |
| 2000 | 9 | 0 |
| 2001 | 2 | 0 |
| 2002 | 5 | 2 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 2 | 4 |
| 2006 | 0 | 3 |
| 2007 | 0 | 2 |
| 2008 | 3 | 2 |
| 2009 | 0 | 3 |
| 2010 | 2 | 2 |
| 2011 | 1 | 2 |
| 2012 | 3 | 2 |
| 2013 | 0 | 0 |
| 2014 | 2 | 2 |
| 2015 | 2 | 2 |
| 2016 | 1 | 1 |
| 2017 | 0 | 1 |
| 2018 | 1 | 0 |
| 2019 | 2 | 5 |
| 2020 | 4 | 7 |
| 2021 | 3 | 4 |
| 2022 | 8 | 9 |
| 2023 | 4 | 2 |
| 2024 | 1 | 0 |
| 2025 | 3 | 3 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Carbon-based catalytic devices25 Aug 2026US 12,716,136 B2Regents of the University of Minnesota
- Simultaneous selective deposition of two different materials on two different surfaces3 Feb 2026US 12,540,387 B2ASM IP Holding B. V.
- Simultaneous selective deposition of two different materials on two different surfaces18 Nov 2025US 12,473,631 B2ASM IP Holding B. V.
- Method for preparing a substrate21 Oct 2025US 12,451,351 B2Enkris Semiconductor, Inc.
- Method of manufacturing oxide crystal thin film14 Jan 2025US 12,195,844 B2Flosfia Inc.
- Intramolecular stabilized group 13 metal complexes with improved thermal stability for vapor phase thin-film deposition techniques2 Jul 2026US 2026/0185214 A1Merck Patent GmbH
- Aluminum borohydride amine coordination compounds25 Jun 2026US 2026/0176748 A1ASM IP Holding B. V.
- Area selective deposition of aluminum based films using alkyl aluminum amidinate precursors9 Apr 2026US 2026/0098050 A1Entegris, Inc.
- Simultaneous selective deposition of two different materials on two different surfaces29 Jan 2026US 2026/0028712 A1ASM IP Holding B. V.
- Aluminum-containing inhibitor compounds for selective deposition28 Aug 2025US 2025/0270409 A1Entegris, Inc.
Most cited
By later US patents
- Method for producing a flow of triisobutylaluminum from liquid triisobutylaluminum containing isobutene345US 5,354,433 AASM International N.V. · 1994
- Method for forming a metal contact66US 5,108,951 ASGS-Thomson Microelectronics S.A. · 1992
- Process for the chemical vapor deposition of aluminum49US 4,923,717 ARegents of the University of Minnesota · 1990
- CVD method for forming metal-containing films47US 5,874,131 AMicron Technology, Inc. · 1999
- Method of making an integrated circuit structure by using a non-conductive plug45US 5,472,912 ASGS-Thomson Microelectronics S.A. · 1995