C23C 16/18
From metallo-organic compounds
Official title: from metallo-organic compounds
C23C16/18 (From metallo-organic compounds) appears on 1,297 US grants and 1,438 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,297
- Published applications
- 1,438
- Assignees
- 422
- Inventors
- 2,413
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 5 | 0 |
| 1989 | 6 | 0 |
| 1990 | 11 | 0 |
| 1991 | 9 | 0 |
| 1992 | 18 | 0 |
| 1993 | 11 | 0 |
| 1994 | 17 | 0 |
| 1995 | 22 | 0 |
| 1996 | 18 | 0 |
| 1997 | 10 | 0 |
| 1998 | 22 | 0 |
| 1999 | 28 | 0 |
| 2000 | 45 | 0 |
| 2001 | 31 | 20 |
| 2002 | 49 | 52 |
| 2003 | 39 | 51 |
| 2004 | 41 | 42 |
| 2005 | 33 | 43 |
| 2006 | 24 | 52 |
| 2007 | 35 | 54 |
| 2008 | 28 | 50 |
| 2009 | 31 | 72 |
| 2010 | 46 | 58 |
| 2011 | 24 | 43 |
| 2012 | 41 | 49 |
| 2013 | 41 | 59 |
| 2014 | 47 | 53 |
| 2015 | 48 | 58 |
| 2016 | 40 | 65 |
| 2017 | 44 | 63 |
| 2018 | 56 | 59 |
| 2019 | 45 | 51 |
| 2020 | 41 | 55 |
| 2021 | 42 | 53 |
| 2022 | 60 | 88 |
| 2023 | 45 | 84 |
| 2024 | 39 | 53 |
| 2025 | 56 | 60 |
| 2026 | 37 | 51 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Carbon-based catalytic devices25 Aug 2026US 12,716,136 B2Regents of the University of Minnesota
- Deposition of noble metal islets or thin films for its use for electrochemical catalysts with improved catalytic activity11 Aug 2026US 12,703,913 B2L Air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation des Procedes Georges Claude
- Method for forming silicon oxide film11 Aug 2026US 12,703,914 B2Air Water Inc.
- Selective cobalt deposition on copper surfaces14 Jul 2026US 12,680,158 B2APPLIED Materials.Inc.
- Methods and systems for filling a gap14 Jul 2026US 12,685,118 B2ASM IP Holding B. V.
- Collecting apparatus and collecting method1 Oct 2026US 2026/0297739 A1Jusung Engineering Co., Ltd.
- Plasma and Photon assisted Metal-Organic Chemical Vapor Deposition24 Sep 2026US 2026/0286510 A1PhantaField Inc.
- Low-temperature deposition material, method of forming low-temperature deposition film, and semiconductor substrate and semiconductor device fabricated using the same24 Sep 2026US 2026/0286523 A1
- Lightning strike protection skin17 Sep 2026US 2026/0275518 A1Rohr, Inc.
- Selective deposition of material comprising noble metal10 Sep 2026US 2026/0265914 A1ASM IP Holding B. V.
Most cited
By later US patents
- Precursor source mixtures666US 6,984,591 B1International Business Machines Corporation · 2006
- Method of forming dielectric films, new precursors and their use in semiconductor manufacturing541US 8,668,957 B2L Air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation des Procedes Georges Claude · 2014
- Solid precursor-based delivery of fluid utilizing controlled solids morphology537US 8,821,640 B2Advanced Technology Materials, Inc. · 2014
- Selective deposition of metals, metal oxides, and dielectrics527US 9,895,715 B2ASM IP Holding B. V. · 2018
- Methodology for in-situ doping of aluminum coatings518US 6,534,133 B1The Research Foundation of State University of New York · 2003