Back to results
US 12,703,913 B2Granted
Deposition of noble metal islets or thin films for its use for electrochemical catalysts with improved catalytic activity
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsTakashi Ono, Takashi Teramoto, Christian Dussarrat
Life of this patent
Estimating the term…
Abstract
Platinum group metal containing chemical precursors suitable for vapor deposition are disclosed. Methods of using these precursors for Platinum depositions are also disclosed. The chemical precursors and methods are particularly suitable for depositing catalyst material on electrodes.
Claims11
A chemical having the formula M(L5)(L6)x3 wherein L5 is an allyl ligand, L6 is an amidinate ligand and x3=1:
- wherein each of R1, R2, R3, R4, R5, R6, R7, and R8 are independently selected from H;
- a C1-C6 linear, branched, or cyclic alkyl group;
- a C1-C6, branched, or cyclic alkylsilyl group (mono, bis, or tris alkyl);
- a C1-C6 linear, branched, or cyclic alkylamino group;
- or a C1-C6 linear, branched, or cyclic fluoroalkyl group.
2 more elements
Dependencies are inferred from the claim text.