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US 4,923,717 AGranted
Process for the chemical vapor deposition of aluminum
AssigneeRegents of the University of Minnesota
InventorsWayne L. Gladfelter, David C. Boyd
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Abstract
A method for forming aluminum films is provided comprising employing the techniques of chemical vapor deposition to thermally decompose a vapor comprising a aluminum hydride subsequent to the treatment of the substrate with a Group IVB or VB metal complex, so as to deposit a mirror-like coating of aluminum on the surface of a substrate.
Claims11
A method for applying an aluminum film to the surface of a substrate comprising employing the techniques of flowthrough chemical vapor deposition to:
- (a) expose the surface to a first vapor comprising a Group IVB or VB metal complex;
- and
- (b) expose the surface to a second vapor to deposit a mirror-like coating of aluminum thereon;
- said second vapor comprising a compound of the formula
- [(R.sub.1 R.sup.2 R.sup.3)Y].sub.x AlH.sub.3 wherein:
- (i) Y is a Group VA element;
- (ii) R.sup.1, R.sup.2, and R.sup.3 are independently alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkenyl, alkaryl, aryl, or aralkyl;
- and
- (iii) x is an integer with a value of 1 or 2.
6 more elements
Dependencies are inferred from the claim text.