C23C 14/3457
Using other particles than noble gas ions
Official title: {using other particles than noble gas ions (C23C14/0036, C23C14/46 take precedence)}
C23C14/3457 (Using other particles than noble gas ions) appears on 52 US grants and 80 published applications in this corpus.
Search patents in C23C- Granted patents
- 52
- Published applications
- 80
- Assignees
- 49
- Inventors
- 179
- Latest grant
- 28 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 3 | 4 |
| 2003 | 3 | 7 |
| 2004 | 3 | 6 |
| 2005 | 4 | 3 |
| 2006 | 1 | 0 |
| 2007 | 0 | 4 |
| 2008 | 0 | 2 |
| 2009 | 2 | 4 |
| 2010 | 1 | 1 |
| 2011 | 1 | 2 |
| 2012 | 0 | 1 |
| 2013 | 1 | 0 |
| 2014 | 5 | 5 |
| 2015 | 2 | 5 |
| 2016 | 1 | 8 |
| 2017 | 4 | 9 |
| 2018 | 2 | 4 |
| 2019 | 4 | 3 |
| 2020 | 1 | 5 |
| 2021 | 1 | 2 |
| 2022 | 3 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 1 |
| 2025 | 1 | 2 |
| 2026 | 3 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Film formation apparatus28 Jul 2026US 12,692,590 B2Japan Display Inc.
- Method for improving deposition process14 Apr 2026US 12,603,265 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Optical filter including a high refractive index material7 Apr 2026US 12,595,549 B2Viavi Solutions Inc.
- Near infrared optical interference filters with improved transmission23 Sep 2025US 12,422,605 B2Materion Corporation
- Method for improving deposition process8 Oct 2024US 12,112,930 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for Improving Deposition Process16 Jul 2026US 2026/0204528 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Near infrared optical interference filters with improved transmission25 Dec 2025US 2025/0389880 A1Materion Corporation
- Film formation apparatus8 May 2025US 2025/0146125 A1Japan Display Inc.
- Method for Improving Deposition Process21 Nov 2024US 2024/0387155 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Near infrared optical interference filters with improved transmission22 Sep 2022US 2022/0299688 A1Materion Corporation
Most cited
By later US patents
- Wafer bias ring in a sustained self-sputtering reactor99US 5,897,752 AAPPLIED Materials.Inc. · 1999
- Plasma reactor and shields generating self-ionized plasma for sputtering70US 6,398,929 B1APPLIED Materials.Inc. · 2002
- Sputtering apparatus and film forming method68US 6,423,192 B1Kabushiki Kaisha Toshiba · 2002
- Methods of sputtering a protective coating on a semiconductor substrate57US 7,601,246 B2Lam Research Corporation · 2009
- Process for sputtering copper in a self ionized plasma41US 6,582,569 B1APPLIED Materials.Inc. · 2003