C23C 14/3421
Using heated targets
Official title: {using heated targets}
C23C14/3421 (Using heated targets) appears on 30 US grants and 34 published applications in this corpus.
Search patents in C23C- Granted patents
- 30
- Published applications
- 34
- Assignees
- 32
- Inventors
- 105
- Latest grant
- 18 Jul 2023
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 2 | 2 |
| 2003 | 0 | 2 |
| 2004 | 2 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 2 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 2 |
| 2011 | 0 | 1 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 2 | 1 |
| 2015 | 0 | 0 |
| 2016 | 1 | 0 |
| 2017 | 1 | 0 |
| 2018 | 0 | 4 |
| 2019 | 2 | 6 |
| 2020 | 5 | 3 |
| 2021 | 1 | 5 |
| 2022 | 5 | 1 |
| 2023 | 2 | 1 |
| 2024 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Method for forming a film of an oxide of In, Ga, and Zn18 Jul 2023US 11,702,731 B2APPLIED Materials.Inc.
- Temperature control roller, transporting arrangement and vacuum arrangement31 Jan 2023US 11,566,321 B2Von Ardenne Asset GmbH & Co. KG
- Heated shield for physical vapor deposition chamber24 May 2022US 11,339,466 B2APPLIED Materials.Inc.
- Sputtering target for insulating oxide film, method for forming insulating oxide film, and method for producing field-effect transistor24 May 2022US 11,342,447 B2Ricoh Company, Ltd.
- Method for forming aluminum film26 Apr 2022US 11,313,031 B2Mitsubishi Electric Corporation
- Glassy Carbon Shutter Disk For Physical Vapor Deposition (PVD) Chamber21 Mar 2024US 2024/0093355 A1APPLIED Materials.Inc.
- Method for producing an optical element, optical element, device for producing an optical element, secondary gas and projection exposure system17 Aug 2023US 2023/0257866 A1Carl Zeiss SMT GmbH
- Method for forming aluminum film24 Mar 2022US 2022/0090255 A1Mitsubishi Electric Corporation
- Heated shield for physical vapor deposition chamber23 Sep 2021US 2021/0292888 A1APPLIED Materials.Inc.
- Joined Body of Target Material and Backing Plate, and Method for Producing Joined Body of Target Material and Backing Plate10 Jun 2021US 2021/0172057 A1JX Nippon Mining & Metals Corporation
Most cited
By later US patents
- Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device134US 6,689,486 B22004
- Magnetron sputtering of magnetic materials35US 4,324,631 ASpin Physics, Inc. · 1982
- Magnetically-assisted sputtering method for producing vertical recording media16US 4,414,087 A1983
- System and method for controlling thin film defects11US 6,835,290 B2Seagate Technology LLC · 2004
- Sputtering apparatus10US 5,082,545 AMatsushita Electric Industrial Co., Ltd. · 1992