Heated shield for physical vapor deposition chamber
AssigneeApplied Materials, Inc.
InventorsIlya Lavitsky, Keith A Miller, GOICHI Yoshidome
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsIlya Lavitsky, Keith A Miller, GOICHI Yoshidome
Estimating the term…
Embodiments of a process shield for use in a process chamber are provided herein. In some embodiments, a process shield for use in a process chamber includes a body having a cylindrical shape, wherein the body includes an upper portion and a lower portion, the upper portion having an outer lip and the lower portion extending downward and radially inward from the upper portion, wherein the outer lip includes a plurality of openings to accommodate fasteners, a plurality of alignment slots extending radially inward from an outer surface of the outer lip, and a notched lower peripheral edge, and wherein a lower surface of the outer lip includes a plurality of grooves.
A process shield for use in a process chamber, comprising:
A process kit for use in a process chamber, comprising:
A process chamber, comprising:
Dependencies are inferred from the claim text.