Glassy Carbon Shutter Disk For Physical Vapor Deposition (PVD) Chamber

A non-transitory computer readable storage medium having stored thereon instructions that when executed by a processor perform a method for cleaning a process kit disposed in an inner volume of a physical vapor deposition (PVD) chamber, the method comprising:

• positioning a glassy carbon shutter disk on a substrate support of the PVD chamber;
• energizing an oxygen-containing cleaning gas disposed in the inner volume of the PVD chamber to create a plasma reactive with carbon-based materials;
• and
• heating the process kit having a carbon-based material adhered thereto while exposed to the plasma to remove at least a portion of the carbon-based material adhered to the process kit.

A physical vapor deposition (PVD) chamber for processing a substrate, comprising:

• a chamber wall at least partially defining an inner volume within the PVD chamber;
• a carbon-based sputtering target disposed in an upper section of the inner volume;
• a pedestal including a substrate support having a support surface to support a substrate below the sputtering target;
• a power source configured to energize sputtering gas for forming a plasma in the inner volume;
• a process kit surrounding the sputtering target and the substrate support;
• and
• a glassy carbon shutter disk positionable on the substrate support of the PVD chamber.