B81C 1/00857
After manufacture
Official title: {after manufacture, e.g. back-end of the line process}
B81C1/00857 (After manufacture) appears on 7 US grants and 10 published applications in this corpus.
Search patents in B81C- Granted patents
- 7
- Published applications
- 10
- Assignees
- 9
- Inventors
- 38
- Latest grant
- 30 Dec 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 0 | 1 |
| 2016 | 1 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 1 |
| 2019 | 0 | 0 |
| 2020 | 1 | 1 |
| 2021 | 0 | 0 |
| 2022 | 1 | 2 |
| 2023 | 0 | 1 |
| 2024 | 0 | 1 |
| 2025 | 2 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mirror device manufacturing method and mirror unit manufacturing method30 Dec 2025US 12,509,347 B2Hamamatsu Photonics K.K.
- Cleaning composition with molybdenum etching inhibitor2 Dec 2025US 12,486,581 B2Entegris, Inc.
- Method for removing foreign matter and method for manufacturing optical detection device5 Apr 2022US 11,294,170 B2Hamamatsu Photonics K.K.
- Method of cleaning and drying semiconductor substrate20 Oct 2020US 10,811,247 B2Shin-Etsu Chemical Co., Ltd.
- Method for manufacturing a structured surface12 Jan 2016US 9,233,843 B2Robert Bosch GmbH
- Cleaning composition with molybdenum etching inhibitor12 Feb 2026US 2026/0043148 A1Entegris, Inc.
- Method of manufacturing a microstructure18 Jul 2024US 2024/0239649 A1Memsstar Limited
- Cleaning composition with molybdenum etching inhibitor14 Dec 2023US 2023/0399754 A1Entegris, Inc.
- Mirror device manufacturing method and mirror unit manufacturing method17 Nov 2022US 2022/0363535 A1Hamamatsu Photonics K.K.
- Method for transferring microstructures, and method for mounting microstructures6 Oct 2022US 2022/0315418 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Method of cleaning and treating a semiconductor device including a micromechanical device97US 6,024,801 ATexas Instruments Incorporated · 2000
- Dry cleaning method14US 6,500,268 B1Silicon Genesis Corporation · 2002
- Method of cleaning and drying semiconductor substrate1US 10,811,247 B2Shin-Etsu Chemical Co., Ltd. · 2020