B81C 1/00841
Cleaning during or after manufacture
Official title: {Cleaning during or after manufacture (cleaning of semiconductor devices H10P50/00)}
B81C1/00841 (Cleaning during or after manufacture) appears on 55 US grants and 70 published applications in this corpus.
Search patents in B81C- Granted patents
- 55
- Published applications
- 70
- Assignees
- 49
- Inventors
- 190
- Latest grant
- 28 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 3 | 1 |
| 2003 | 1 | 2 |
| 2004 | 1 | 1 |
| 2005 | 0 | 2 |
| 2006 | 0 | 2 |
| 2007 | 0 | 1 |
| 2008 | 1 | 2 |
| 2009 | 1 | 1 |
| 2010 | 3 | 0 |
| 2011 | 1 | 2 |
| 2012 | 0 | 3 |
| 2013 | 1 | 2 |
| 2014 | 0 | 1 |
| 2015 | 2 | 6 |
| 2016 | 4 | 4 |
| 2017 | 5 | 4 |
| 2018 | 6 | 4 |
| 2019 | 2 | 7 |
| 2020 | 2 | 4 |
| 2021 | 6 | 6 |
| 2022 | 2 | 4 |
| 2023 | 3 | 3 |
| 2024 | 0 | 4 |
| 2025 | 8 | 2 |
| 2026 | 1 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method and device for locally removing and/or modifying a polymer material on a surface28 Apr 2026US 12,612,305 B2Robert Bosch GmbH
- Mirror device manufacturing method and mirror unit manufacturing method30 Dec 2025US 12,509,347 B2Hamamatsu Photonics K.K.
- Cleaning composition with molybdenum etching inhibitor2 Dec 2025US 12,486,581 B2Entegris, Inc.
- Foreign particle removing method, formation method, article manufacturing method, foreign particle removing apparatus, and system28 Oct 2025US 12,453,991 B2Canon Kabushiki Kaisha
- Method for fabricating a microfluidic device7 Oct 2025US 12,434,962 B2Imec Vzw
- Micro-particle cleaning method for micro-electromechanical systems devices with movable surface structures21 May 2026US 2026/0138868 A1Lumentum Operations LLC
- Cleaning composition with molybdenum etching inhibitor12 Feb 2026US 2026/0043148 A1Entegris, Inc.
- Composition, its use and a process for cleaning substrates comprising cobalt and copper2 Oct 2025US 2025/0305152 A1BASF SE
- Method and System for Torsional Optical Manipulation to Remove Particles from Semiconductor Surfaces8 May 2025US 2025/0149326 A1
- Coating of Nanowires12 Sep 2024US 2024/0304581 A1NanoWired GmbH
Most cited
By later US patents
- Process for masking and removal of residue from complex shapes147US 8,518,832 B1Western Digital (Fremont), LLC · 2013
- Method of cleaning and treating a semiconductor device including a micromechanical device97US 6,024,801 ATexas Instruments Incorporated · 2000
- Microelectromechanical device manufacturing process38US 6,337,027 B12002
- Post metal etch clean process using soft mask17US 6,542,282 B2Texas Instruments Incorporated · 2003
- Dry cleaning method14US 6,500,268 B1Silicon Genesis Corporation · 2002