Method for fabricating a microfluidic device
AssigneeImec Vzw
InventorsGiuseppe Fiorentino, Aurelie Humbert, Simone Severi, Benjamin Jones
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Abstract
A method for fabricating a microfluidic device includes providing an assembly that includes a first silicon substrate having a hydrophilic silicon oxide top surface that includes a microfluidic channel and a second silicon substrate having a hydrophilic silicon oxide bottom surface directly bonded on the top surface of the first silicon substrate, the second silicon substrate including fluidic access holes giving fluidic access to the microfluidic channel. The method also includes exposing the assembly to oxidative species including one or more oxygen atoms and to heat so as to form silicon oxide at a surface of the access holes and of the microfluidic channel.
Claims17
A method comprising:
- forming a first hydrophilic silicon oxide surface on a first silicon substrate that includes a microfluidic channel;
- forming a second hydrophilic silicon oxide surface on a second silicon substrate;
- bonding the first hydrophilic silicon oxide surface to the second hydrophilic silicon oxide surface such that the microfluidic channel is partially closed by the second hydrophilic silicon oxide surface;
- and
- removing a portion of the second silicon substrate, thereby forming a fluidic access hole that passes through the second silicon substrate to provide access to the microfluidic channel.
Dependencies are inferred from the claim text.