Y10S 438/975
Substrate or mask aligning feature
Y10S438/975 (Substrate or mask aligning feature) appears on 600 US grants and 288 published applications in this corpus.
Search patents in Y10S- Granted patents
- 600
- Published applications
- 288
- Assignees
- 180
- Inventors
- 859
- Latest grant
- 22 Oct 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 3 | 0 |
| 1978 | 5 | 0 |
| 1979 | 3 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 5 | 0 |
| 1983 | 6 | 0 |
| 1984 | 7 | 0 |
| 1985 | 5 | 0 |
| 1986 | 4 | 0 |
| 1987 | 3 | 0 |
| 1988 | 6 | 0 |
| 1989 | 3 | 0 |
| 1990 | 6 | 0 |
| 1991 | 8 | 0 |
| 1992 | 9 | 0 |
| 1993 | 7 | 0 |
| 1994 | 13 | 0 |
| 1995 | 13 | 0 |
| 1996 | 19 | 0 |
| 1997 | 22 | 0 |
| 1998 | 30 | 0 |
| 1999 | 40 | 0 |
| 2000 | 37 | 0 |
| 2001 | 28 | 11 |
| 2002 | 26 | 29 |
| 2003 | 36 | 32 |
| 2004 | 34 | 38 |
| 2005 | 30 | 39 |
| 2006 | 44 | 26 |
| 2007 | 23 | 29 |
| 2008 | 15 | 13 |
| 2009 | 26 | 24 |
| 2010 | 19 | 13 |
| 2011 | 20 | 10 |
| 2012 | 12 | 6 |
| 2013 | 7 | 5 |
| 2014 | 8 | 6 |
| 2015 | 7 | 3 |
| 2016 | 2 | 2 |
| 2017 | 3 | 2 |
| 2018 | 0 | 0 |
| 2019 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Apparatus and methods for detecting overlay errors using scatterometry22 Oct 2019US 10,451,412 B2KLA-Tencor Corporation
- Solid-state imaging device and method of manufacturing solid-state imaging device2 Apr 2019US 10,249,665 B2Sony Corporation
- Lithography alignment marks21 Nov 2017US 9,823,574 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus for measuring overlay errors11 Jul 2017US 9,702,693 B2KLA-Tencor Corporation
- Semiconductor device having a high-K gate dielectric above an STI region23 May 2017US 9,659,928 B2Advanced Micro Devices, Inc.
- Apparatus and methods for detecting overlay errors using scatterometry23 Nov 2017US 2017/0336198 A1KLA-Tencor Corporation
- Lithography Alignment Marks30 Mar 2017US 2017/0090299 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus for measuring overlay errors27 Oct 2016US 2016/0313116 A1KLA-Tencor Corporation
- Apparatus and methods for detecting overlay errors using scatterometry18 Feb 2016US 2016/0047744 A1KLA-Tencor Corporation
- Semiconductor device having high-k gate dielectric above an sti region2 Jul 2015US 2015/0187765 A1Advanced Micro Devices, Inc.
Most cited
By later US patents
- Process for manufacturing three dimensional IC's337US 5,266,511 AFujitsu Limited · 1993
- Method of making an adaptive configurable gate array305US 5,217,916 ATRW Inc. · 1993
- Chip and multi-chip semiconductor device using thereof and method for manufacturing same301US 7,122,912 B2NEC Electronics Corporation · 2006
- Method for forming interconnections for semiconductor fabrication and semiconductor device having such interconnections290US 5,739,579 AIntel Corporation · 1998
- Method for fabricating an SOI device in alignment with a device region formed in a semiconductor substrate268US 5,294,556 AFujitsu Limited · 1994