H10W 10/0128
Comprising multiple local oxidation process steps
Official title: {comprising multiple local oxidation process steps}
H10W10/0128 (Comprising multiple local oxidation process steps) appears on 101 US grants and 31 published applications in this corpus.
Search patents in H10W- Granted patents
- 101
- Published applications
- 31
- Assignees
- 53
- Inventors
- 179
- Latest grant
- 16 Dec 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 3 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 2 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 6 | 0 |
| 1996 | 1 | 0 |
| 1997 | 5 | 0 |
| 1998 | 4 | 0 |
| 1999 | 7 | 0 |
| 2000 | 7 | 0 |
| 2001 | 7 | 4 |
| 2002 | 6 | 2 |
| 2003 | 2 | 0 |
| 2004 | 2 | 0 |
| 2005 | 0 | 2 |
| 2006 | 2 | 1 |
| 2007 | 0 | 2 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 2 |
| 2014 | 1 | 2 |
| 2015 | 2 | 3 |
| 2016 | 1 | 0 |
| 2017 | 2 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 2 |
| 2020 | 1 | 0 |
| 2021 | 2 | 2 |
| 2022 | 0 | 3 |
| 2023 | 2 | 3 |
| 2024 | 2 | 2 |
| 2025 | 5 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Method for making deep trench isolation of CIS device, and semiconductor device structure16 Dec 2025US 12,500,116 B2Hua Hong Semiconductor (Wuxi) Limited
- Control of locos structure thickness without a mask29 Jul 2025US 12,376,370 B2Texas Instruments Incorporated
- Gate and locos dielectrics grown using locos processing8 Jul 2025US 12,354,905 B2Texas Instruments Incorporated
- Method for fabricating semiconductor device with chelating agent24 Jun 2025US 12,341,054 B2Nanya Technology Corporation
- High voltage device and manufacturing method thereof8 Apr 2025US 12,272,592 B2Richtek Technology Corporation
- Control of locos structure thickness without a mask13 Nov 2025US 2025/0351544 A1Texas Instruments Incorporated
- High voltage device and manufacturing method thereof5 Sep 2024US 2024/0297067 A1Richtek Technology Corporation
- Control of locos structure thickness without a mask1 Aug 2024US 2024/0258175 A1Texas Instruments Incorporated
- Method for fabricating semiconductor device with pre-cleaning treatment5 Oct 2023US 2023/0317508 A1Nanya Technology Corporation
- Gate and locos dielectrics grown using locos processing3 Aug 2023US 2023/0245919 A1Texas Instruments Incorporated
Most cited
By later US patents
- Shallow trench isolation technique396US 5,719,085 AIntel Corporation · 1998
- Shallow trench isolation of MOSFETS with reduced corner parasitic currents225US 5,989,978 AChartered Semiconductor Manufacturing Ltd. · 1999
- Isotropic polysilicon plus nitride stripping224US 6,110,838 ATexas Instruments Incorporated · 2000
- Semiconductor chip having fieldless array with salicide gates and methods for making same113US 6,174,758 B1Tower Semiconductor Ltd. · 2001
- MOS Isolation processing86US 4,551,910 AIntel Corporation · 1985