H10D 86/431
Having different compositions, shapes, layouts or thicknesses of gate insulators in different
Official title: {having different compositions, shapes, layouts or thicknesses of gate insulators in different TFTs}
H10D86/431 (Having different compositions, shapes, layouts or thicknesses of gate insulators in different) appears on 504 US grants and 617 published applications in this corpus.
Search patents in H10D- Granted patents
- 504
- Published applications
- 617
- Assignees
- 120
- Inventors
- 1,054
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 0 | 0 |
| 2000 | 3 | 0 |
| 2001 | 4 | 2 |
| 2002 | 5 | 6 |
| 2003 | 7 | 8 |
| 2004 | 7 | 11 |
| 2005 | 10 | 10 |
| 2006 | 5 | 7 |
| 2007 | 5 | 9 |
| 2008 | 9 | 13 |
| 2009 | 7 | 10 |
| 2010 | 16 | 7 |
| 2011 | 5 | 11 |
| 2012 | 11 | 5 |
| 2013 | 6 | 7 |
| 2014 | 6 | 13 |
| 2015 | 14 | 33 |
| 2016 | 23 | 32 |
| 2017 | 36 | 36 |
| 2018 | 28 | 33 |
| 2019 | 35 | 45 |
| 2020 | 33 | 33 |
| 2021 | 32 | 88 |
| 2022 | 54 | 35 |
| 2023 | 42 | 35 |
| 2024 | 38 | 50 |
| 2025 | 36 | 37 |
| 2026 | 19 | 41 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Display apparatus22 Sep 2026US 12,745,511 B2LG Display Co., Ltd.
- Drive substrates and display panels18 Aug 2026US 12,713,697 B2Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Array substrate and method for manufacturing same, display panel and display device7 Jul 2026US 12,677,545 B2Boe Technology Group Co., Ltd.
- Semiconductor device2 Jun 2026US 12,648,186 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Display device and method of providing the same26 May 2026US 12,641,957 B2Samsung Display Co., Ltd.
- Inverter including oxide semiconductor, memory device including inverter, and electronic apparatus including memory device24 Sep 2026US 2026/0293213 A1Samsung Electronics Co., Ltd.
- Performance optimization by sizing gates and source/drain contacts differently for different transistors17 Sep 2026US 2026/0282492 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor device and method for manufacturing semiconductor device10 Sep 2026US 2026/0271339 A1Semiconductor Energy Laboratory Co.Ltd.
- Method of manufacturing a semiconductor device and a semiconductor device10 Sep 2026US 2026/0271344 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Display device and electronic device including the same10 Sep 2026US 2026/0271525 A1Samsung Display Co., Ltd.
Most cited
By later US patents
- Semiconductor device employing crystallization catalyst262US 5,569,936 ASemiconductor Energy Laboratory Co.Ltd. · 1996
- Method of forming a thin film transistor235US 5,595,923 ASemiconductor Energy Laboratory Co.Ltd. · 1997
- Pixel TFT and driver TFT having different gate insulation width194US 6,278,131 B1Semiconductor Energy Laboratory Co.Ltd. · 2001
- Semiconductor device141US 6,147,667 ASemiconductor Energy Laboratory Co.Ltd. · 2000
- Electro-optical device and electronic equipment137US 6,498,369 B1Semiconductor Energy Laboratory Co.Ltd. · 2002