H05G 2/0088
For preconditioning the plasma generating material
Official title: {for preconditioning the plasma generating material}
H05G2/0088 (For preconditioning the plasma generating material) appears on 133 US grants and 163 published applications in this corpus.
Search patents in H05G- Granted patents
- 133
- Published applications
- 163
- Assignees
- 33
- Inventors
- 232
- Latest grant
- 7 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 1 | 2 |
| 2006 | 0 | 3 |
| 2007 | 2 | 2 |
| 2008 | 1 | 8 |
| 2009 | 4 | 5 |
| 2010 | 4 | 7 |
| 2011 | 4 | 5 |
| 2012 | 3 | 9 |
| 2013 | 14 | 10 |
| 2014 | 9 | 9 |
| 2015 | 8 | 10 |
| 2016 | 11 | 8 |
| 2017 | 9 | 9 |
| 2018 | 8 | 9 |
| 2019 | 9 | 10 |
| 2020 | 10 | 13 |
| 2021 | 9 | 6 |
| 2022 | 8 | 9 |
| 2023 | 1 | 8 |
| 2024 | 8 | 9 |
| 2025 | 8 | 5 |
| 2026 | 2 | 6 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- EUV excitation light source and euv light source7 Apr 2026US 12,598,688 B2TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- EUV light generation system and electronic device manufacturing method20 Jan 2026US 12,532,401 B2Gigaphoton Inc.
- Semiconductor processing tool and methods of operation30 Dec 2025US 12,513,809 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor processing tool and methods of operation23 Sep 2025US 12,422,755 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method of manufacturing integrated circuit12 Aug 2025US 12,389,518 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Euv light generation system and electronic device manufacturing method26 Mar 2026US 2026/0089825 A1Gigaphoton Inc.
- Semiconductor processing tool and methods of operation26 Mar 2026US 2026/0089826 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Euv light generation apparatus and electronic device manufacturing method26 Feb 2026US 2026/0059641 A1Gigaphoton Inc.
- Light Source Apparatus26 Feb 2026US 2026/0059642 A1Ushio Denki Kabushiki Kaisha
- Method and laser system for generating secondary radiation22 Jan 2026US 2026/0025901 A1
Most cited
By later US patents
- Laser produced plasma EUV light source42US 7,671,349 B2Cymer, Inc. · 2010
- Laser-produced plasma EUV light source with pre-pulse enhancement36US 6,973,164 B2University of Central Florida Research Foundation, Inc. · 2005
- Method and arrangement for producing radiation33US 7,239,686 B2Jettec AB · 2007
- Extreme ultraviolet light source device and control method for extreme ultraviolet light source device29US 8,242,472 B2Gigaphoton Inc. · 2012
- Extreme ultraviolet lithography collector contamination reduction27US 9,625,824 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2017