EUV light generation system and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• generating EUV light using an EUV light generation system;
• outputting the EUV light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the EUV light in the exposure apparatus to manufacture an electronic device,
• the EUV light generation system including:
• a prepulse laser device configured to output prepulse laser light to be radiated to a target supplied into a chamber;
• a main pulse laser device configured to output main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light;
• a first actuator configured to adjust an irradiation position of the prepulse laser light;
• a second actuator configured to adjust an irradiation position of the main pulse laser light independently from the irradiation position of the prepulse laser light;
• an EUV sensor configured to detect EUV energy of the EUV light generated by the diffusion target being irradiated with the main pulse laser light;
• a laser energy sensor configured to detect laser energy of the main pulse laser light before being radiated to the diffusion target;
• a target sensor configured to image the diffusion target;
• and
• a controller configured to control, after controlling the first actuator based on a size of the diffusion target calculated from an image of the diffusion target obtained by the target sensor, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor is increased.

A method of manufacturing an electronic device, comprising:

• generating EUV light using an EUV light generation system;
• inspecting a defect of a mask by irradiating the mask with the EUV light;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the EUV light generation system including:
• a prepulse laser device configured to output prepulse laser light to be radiated to a target supplied into a chamber;
• a main pulse laser device configured to output main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light;
• a first actuator configured to adjust an irradiation position of the prepulse laser light;
• a second actuator configured to adjust an irradiation position of the main pulse laser light independently from the irradiation position of the prepulse laser light;
• an EUV sensor configured to detect EUV energy of the EUV light generated by the diffusion target being irradiated with the main pulse laser light;
• a laser energy sensor configured to detect laser energy of the main pulse laser light before being radiated to the diffusion target;
• a target sensor configured to image the diffusion target;
• and
• a controller configured to control, after controlling the first actuator based on a size of the diffusion target calculated from an image of the diffusion target obtained by the target sensor, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor is increased.