EUV excitation light source and euv light source
AssigneeTRUMPF Lasersystems for Semiconductor Manufacturing GmbH
InventorStefan Piehler
Life of this patent
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Abstract
An EUV excitation light source includes a laser source configured to emit a laser beam. The laser beam includes two partial beams having different wavelengths. The EUV excitation light source further includes a separating optical element for separating the two partial beams of the laser beam into two separated beams, and a superposition unit for superimposing the two separated beams at a predefined superposition location with a predefined superposition angle. The separating optical element includes a first reflective diffraction grating.
Claims14
An EUV excitation light source, comprising:
- a laser source configured to emit a laser beam, the laser beam comprising two partial beams having different wavelengths,
- a separating optical element for separating the two partial beams of the laser beam into two separated beams, and
- a superposition unit for superimposing the two separated beams at a predefined superposition location with a predefined superposition angle,
- wherein the separating optical element comprises a first reflective diffraction grating.
Dependencies are inferred from the claim text.