Semiconductor processing tool and methods of operation
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsKuan-Hung CHEN, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
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Abstract
Some implementations described herein provide a dual-feedback control system for laser beam targeting in a lithography system such as an EUV lithography system. In addition to using feedback from a high-frequency quad-cell sensor to adjust a target position of the pre-pulse laser beam based on a first portion of a phase of a wavefront of the pre-pulse laser beam, the dual-feedback control system uses feedback from a low-frequency camera sensor to adjust the target position of the pre-pulse laser beam based on a second portion of the phase of the wavefront.
Claims20
A method, comprising:
- receiving, by a controller, first data corresponding to a first portion of a wavefront of a laser beam;
- receiving, by the controller, second data corresponding to a second portion of the wavefront of the laser beam;
- and
- providing, by the controller based on the first data and the second data, a signal to adjust operation of the laser beam.
A method, comprising:
- receiving, by a controller, data corresponding to different portions of a wavefront of a laser beam from at least two sensors;
- determining, by the controller based on a comparison of the data corresponding to the different portions of the wavefront, that a target position of the laser beam has changed over a time duration;
- and
- adjusting, by the controller based on determining that the target position has changed, a setting of an optical component that directs the laser beam.
A method, comprising:
- receiving, by a controller, data corresponding to different portions of a wavefront of a laser beam from at least two sensors;
- providing, by the controller based on the data, a signal to adjust a setting of an optical component that directs the laser beam;
- determining, by the controller, a correlation between the signal and an amount of radiation generated by a radiation source;
- and
- updating, by the controller based on the correlation, a model configured to estimate the amount of radiation generated by the radiation source.
Dependencies are inferred from the claim text.