Euv light generation apparatus and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• outputting EUV light generated by an EUV light generation apparatus to an exposure apparatus;
• and
• exposing a photosensitive substrate to the EUV light in the exposure apparatus to manufacture an electronic device,
• the EUV light generation apparatus including:
• a chamber;
• a target supply device configured to supply a target into the chamber;
• a first pulse laser device configured to irradiate the target with first pulse laser light in a plasma generation region in the chamber;
• an EUV light concentrating mirror arranged in the chamber and configured to reflect the EUV light, radiated from the plasma generation region, toward an external apparatus;
• and
• a second pulse laser device configured to irradiate a diffusion matter, diffused by the irradiation with the first pulse laser light, with second pulse laser light having an irradiation spot diameter larger than an irradiation spot diameter of the first pulse laser light, and
• an intensity of the EUV light generated by the irradiation with the second pulse laser light being smaller than an intensity of the EUV light generated by the irradiation with the first pulse laser light.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask with EUV light generated by an EUV light generation apparatus;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the EUV light generation apparatus including:
• a chamber;
• a target supply device configured to supply a target into the chamber;
• a first pulse laser device configured to irradiate the target with first pulse laser light in a plasma generation region in the chamber;
• an EUV light concentrating mirror arranged in the chamber and configured to reflect the EUV light, radiated from the plasma generation region, toward an external apparatus;
• and
• a second pulse laser device configured to irradiate a diffusion matter, diffused by the irradiation with the first pulse laser light, with second pulse laser light having an irradiation spot diameter larger than an irradiation spot diameter of the first pulse laser light, and
• an intensity of the EUV light generated by the irradiation with the second pulse laser light being smaller than an intensity of the EUV light generated by the irradiation with the first pulse laser light.