H05G 2/0084
Control of the laser beam
Official title: {Control of the laser beam}
H05G2/0084 (Control of the laser beam) appears on 186 US grants and 231 published applications in this corpus.
Search patents in H05G- Granted patents
- 186
- Published applications
- 231
- Assignees
- 33
- Inventors
- 336
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 2 |
| 2004 | 0 | 2 |
| 2005 | 3 | 5 |
| 2006 | 2 | 1 |
| 2007 | 4 | 4 |
| 2008 | 6 | 3 |
| 2009 | 1 | 0 |
| 2010 | 0 | 0 |
| 2011 | 1 | 3 |
| 2012 | 0 | 5 |
| 2013 | 3 | 5 |
| 2014 | 7 | 14 |
| 2015 | 6 | 13 |
| 2016 | 16 | 16 |
| 2017 | 14 | 18 |
| 2018 | 13 | 18 |
| 2019 | 21 | 17 |
| 2020 | 16 | 19 |
| 2021 | 14 | 12 |
| 2022 | 14 | 14 |
| 2023 | 13 | 15 |
| 2024 | 13 | 14 |
| 2025 | 12 | 13 |
| 2026 | 5 | 17 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation system and electronic device manufacturing method30 Jun 2026US 12,669,756 B2Gigaphoton Inc.
- Light source system and method of operation30 Jun 2026US 12,672,226 B2xLight Inc.
- EUV lithography system with 3D sensing and tunning modules3 Feb 2026US 12,541,152 B2Taiwan Semconductor Manufacturing Company, Ltd.
- EUV light generation system and electronic device manufacturing method20 Jan 2026US 12,532,401 B2Gigaphoton Inc.
- Euv radiation source and position-controllable mirror3 Sep 2026US 2026/0262156 A1ASML Netherlands B. V.
- Method and laser apparatus for generating aneuv light-emitting plasma of a target material13 Aug 2026US 2026/0239521 A1TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Extreme ultraviolet light generation system and electronic device manufacturing method21 May 2026US 2026/0143576 A1Gigaphoton Inc.
- Euv light generation apparatus and electronic device manufacturing method30 Apr 2026US 2026/0122749 A1Gigaphoton Inc.
- Extreme ultraviolet light generation apparatus, droplet generation control method, and electronic device manufacturing method23 Apr 2026US 2026/0113830 A1Gigaphoton Inc.
Most cited
By later US patents
- EUV light source80US 7,164,144 B2Cymer, Inc. · 2007
- High repetition rate laser produced plasma EUV light source70US 7,087,914 B2Cymer, Inc. · 2006
- Laser-produced plasma EUV light source with pre-pulse enhancement36US 6,973,164 B2University of Central Florida Research Foundation, Inc. · 2005
- LPP EUV light source33US 7,317,196 B2Cymer, Inc. · 2008
- X-ray exposure apparatus29US 6,647,086 B2Canon Kabushiki Kaisha · 2003