Euv light generation apparatus and electronic device manufacturing method

An electronic device manufacturing method, comprising:

• outputting EUV light generated by an EUV light generation apparatus to an exposure apparatus;
• and
• exposing a photosensitive substrate to the EUV light in the exposure apparatus to manufacture an electronic device,
• the EUV light generation apparatus being configured to generate the EUV light by irradiating a target output into a chamber with laser light, and including:
• a light concentrating unit configured to concentrate the laser light on the target;
• an angle adjustment mirror configured to adjust an incident angle of the laser light on the light concentrating unit;
• a position adjustment mirror configured to adjust an incident position of the laser light on the light concentrating unit;
• a beam monitor configured to measure a parameter related to variation in the incident position;
• and
• a processor configured to perform control of adjustment by the position adjustment mirror based on a measurement value of the parameter when performing adjustment by the angle adjustment mirror.

An electronic device manufacturing method, comprising:

• inspecting a defect of a mask by irradiating the mask with EUV light generated by an EUV light generation apparatus;
• selecting a mask using a result of the inspection;
• and
• exposing and transferring a pattern formed on the selected mask onto a photosensitive substrate,
• the EUV light generation apparatus being configured to generate the EUV light by irradiating a target output into a chamber with laser light, and including:
• a light concentrating unit configured to concentrate the laser light on the target;
• an angle adjustment mirror configured to adjust an incident angle of the laser light on the light concentrating unit;
• a position adjustment mirror configured to adjust an incident position of the laser light on the light concentrating unit;
• a beam monitor configured to measure a parameter related to variation in the incident position;
• and
• a processor configured to perform control of adjustment by the position adjustment mirror based on a measurement value of the parameter when performing adjustment by the angle adjustment mirror.