H01J 37/3473
Composition uniformity or desired gradient
Official title: {Composition uniformity or desired gradient}
H01J37/3473 (Composition uniformity or desired gradient) appears on 31 US grants and 42 published applications in this corpus.
Search patents in H01J- Granted patents
- 31
- Published applications
- 42
- Assignees
- 32
- Inventors
- 128
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 1 | 1 |
| 2005 | 1 | 1 |
| 2006 | 0 | 1 |
| 2007 | 0 | 1 |
| 2008 | 1 | 0 |
| 2009 | 1 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 3 |
| 2013 | 0 | 2 |
| 2014 | 0 | 1 |
| 2015 | 1 | 3 |
| 2016 | 1 | 9 |
| 2017 | 3 | 2 |
| 2018 | 4 | 5 |
| 2019 | 3 | 3 |
| 2020 | 2 | 0 |
| 2021 | 1 | 1 |
| 2022 | 1 | 4 |
| 2023 | 1 | 1 |
| 2024 | 3 | 1 |
| 2025 | 1 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma etching with metal sputtering11 Aug 2026US 12,706,287 B2Tokyo Electron Limited
- Device and method for coating substrates having planar or shaped surfaces by means of magnetron sputtering23 Sep 2025US 12,421,592 B2Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Cover with a sensor system for a configurable measuring system for a configurable sputtering system31 Dec 2024US 12,183,561 B2Soleras Advanced Coatings BV
- Magnetron plasma sputtering arrangement17 Dec 2024US 12,170,194 B2Danmarks Tekniske Universitet
- Method and system for adjustable coating using magnetron sputtering systems13 Aug 2024US 12,062,531 B2Interpane Entwicklungs-Und Beratungsgesellschaft Mbh & Co. KG
- Plasma Etching with Metal Sputtering25 Jul 2024US 2024/0249927 A1Tokyo Electron Limited
- Method and device for applying a coating, and coated body13 Jul 2023US 2023/0220540 A1CemeCon AG
- A magnetron plasma sputtering arrangement3 Nov 2022US 2022/0351952 A1Danmarks Tekniske Universitet
- Device and method for coating substrates having planar or shaped surfaces by means of magnetron sputtering7 Jul 2022US 2022/0213591 A1Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Methods and apparatus for zone control of rf bias for stress uniformity19 May 2022US 2022/0157563 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Electrochromic devices97US 9,261,751 B2View, Inc. · 2016
- Method for forming a functional deposited film by bias sputtering process at a relatively low substrate temperature67US 5,510,011 ACanon Kabushiki Kaisha · 1996
- Electrochromic devices40US 9,671,664 B2View, Inc. · 2017
- Electrochromic devices35US 10,185,197 B2View, Inc. · 2019
- Target for sputtering29US 4,610,774 AHitachi, Ltd. · 1986