Device and method for coating substrates having planar or shaped surfaces by means of magnetron sputtering

A device for coating substrates having planar or shaped surfaces by magnetron sputtering comprising

• a) a vacuum chamber;
• b) at least one magnetron source having at least one magnetron electrode as coating source;
• c) a turntable having at least one substrate holder, with the turntable enabling a first rotational movement of the substrate and the at least one substrate holder enabling a second rotational movement;
• d) at least one controllable motor that is coupled to the at least one substrate holder and that effects the second rotational movement of the substrate;
• and
• e) a gradient mask having
• a first region that has a geometry for the inhomogeneous coating of the substrate, with the gradient mask having at least one local elevated portion or at least one local depression in profile, with the layer thickness gradient on the substrate being settable via the pitch at the flank of the elevated portion or depression;
• and
• a second region having a geometry that effects a homogeneous coating of a reference substrate.

A method of coating substrates having planar or shaped surfaces by magnetron sputtering, in which

• a) at least one substrate is arranged in an associated substrate holder on a turntable in a vacuum chamber, with the turntable enabling a first rotational movement of the substrate and the at least one substrate holder enabling a second rotational movement, with the second rotational movement taking place via a controllable motor coupled to the substrate holder;
• b) at least one film is deposited on the at least one substrate in a coating cycle by utilizing at least one magnetron source having at least one magnetron electrode, with the layers of source material of the magnetron electrodes being formed by sputter gas and optionally reactive gas, with a gradient mask having
• a first region that has a geometry for the inhomogeneous coating of the substrate, with the gradient mask having at least one local elevated portion or at least one local depression in profile, with the layer thickness gradient on the substrate being settable via the pitch at the flank of the elevated portion or depression;
• and
• a second region having a geometry that effects a homogeneous coating of a reference substrate,
• being used;
• and
• c) the first rotational movement being coordinated with the second rotational movement such that the second rotational movement only takes place outside the coating cycle.