H01J 37/3423
Shape
Official title: {Shape}
H01J37/3423 (Shape) appears on 246 US grants and 289 published applications in this corpus.
Search patents in H01J- Granted patents
- 246
- Published applications
- 289
- Assignees
- 153
- Inventors
- 658
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 4 | 0 |
| 1984 | 4 | 0 |
| 1985 | 2 | 0 |
| 1986 | 3 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 3 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 5 | 0 |
| 1997 | 2 | 0 |
| 1998 | 4 | 0 |
| 1999 | 3 | 0 |
| 2000 | 7 | 0 |
| 2001 | 8 | 5 |
| 2002 | 15 | 4 |
| 2003 | 4 | 3 |
| 2004 | 7 | 7 |
| 2005 | 3 | 8 |
| 2006 | 1 | 10 |
| 2007 | 0 | 18 |
| 2008 | 0 | 10 |
| 2009 | 3 | 12 |
| 2010 | 6 | 8 |
| 2011 | 5 | 7 |
| 2012 | 5 | 10 |
| 2013 | 6 | 7 |
| 2014 | 8 | 11 |
| 2015 | 9 | 15 |
| 2016 | 6 | 22 |
| 2017 | 18 | 25 |
| 2018 | 9 | 23 |
| 2019 | 6 | 9 |
| 2020 | 13 | 18 |
| 2021 | 12 | 12 |
| 2022 | 9 | 16 |
| 2023 | 10 | 11 |
| 2024 | 7 | 9 |
| 2025 | 13 | 7 |
| 2026 | 5 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Deposition system and method1 Sep 2026US 12,727,404 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Sputtering targets, and related apparatuses and methods21 Apr 2026US 12,609,288 B1Seagate Technology LLC
- Sputtering apparatus17 Mar 2026US 12,580,168 B2Canon Anelva Corporation
- Film forming apparatus and film forming method24 Feb 2026US 12,559,835 B2Tokyo Electron Limited
- Cylindrical cathode and chamber using same for sputtering3 Feb 2026US 12,542,263 B2Intevac, Inc.
- Dynamic uniformity control for magnetron sputtering processes27 Aug 2026US 2026/0253853 A1Soleras Advanced Coatings BV
- Process to deposit quantized nano layers by magnetron sputtering15 Jan 2026US 2026/0015711 A1
- Rare earth rotary target and preparation method therefor12 Jun 2025US 2025/0188593 A1Grirem Advanced Materials Co., Ltd.
- Installation, method, and carrier for coating eyeglass lenses12 Jun 2025US 2025/0191900 A1Schneider GmbH & Co. KG
- Multifaceted target for an ion source12 Jun 2025US 2025/0191901 A1Axcelis Technologies, Inc.
Most cited
By later US patents
- Integrated process for copper via filling using a magnetron and target producing highly energetic ions197US 6,277,249 B1APPLIED Materials.Inc. · 2001
- Magnetron and target producing an extended plasma region in a sputter reactor183US 6,251,242 B1APPLIED Materials.Inc. · 2001
- Sputter coating process control method and apparatus156US 5,126,028 AMaterials Research Corporation · 1992
- Integrated process for copper via filling156US 6,274,008 B1APPLIED Materials.Inc. · 2001
- Method and apparatus for sputter coating stepped wafers90US 4,957,605 AMaterials Research Corporation · 1990