Cylindrical cathode and chamber using same for sputtering
AssigneeIntevac, Inc.
InventorsSamuel D. Harkness, IV, Thomas P. Nolan, Jae Ha Choi, Alexander Vassilievich Demtchouk, Terry Bluck
Life of this patent
Estimating the term…
Loading patent…
AssigneeIntevac, Inc.
InventorsSamuel D. Harkness, IV, Thomas P. Nolan, Jae Ha Choi, Alexander Vassilievich Demtchouk, Terry Bluck
Estimating the term…
Sputtering system having cylindrical target with sputtering material on exterior surface; magnet arrangement inside the cylindrical target, having first set of magnets arranged on straight row, each having first pole facing interior wall of the target and second pole facing away from the interior wall, second set having plurality of magnets arranged in obround shape around the first set, each magnet having first pole facing away from the interior wall and second pole facing the interior wall; a keeper plate between the first set of magnets and the second set of magnets, such that straight line passing through an axis connecting the first pole and the second pole of a magnet from the second set intercepts the keeper plate prior to reaching the interior wall; and a cover.
A sputtering system, comprising:
A sputtering system comprising:
A sputtering system, comprising:
Dependencies are inferred from the claim text.