H01J 2237/31744
Introducing gas in vicinity of workpiece
Official title: introducing gas in vicinity of workpiece
H01J2237/31744 (Introducing gas in vicinity of workpiece) appears on 114 US grants and 115 published applications in this corpus.
Search patents in H01J- Granted patents
- 114
- Published applications
- 115
- Assignees
- 50
- Inventors
- 253
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 4 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 3 |
| 2002 | 6 | 3 |
| 2003 | 4 | 6 |
| 2004 | 6 | 11 |
| 2005 | 6 | 11 |
| 2006 | 7 | 9 |
| 2007 | 5 | 10 |
| 2008 | 4 | 6 |
| 2009 | 8 | 5 |
| 2010 | 6 | 7 |
| 2011 | 9 | 0 |
| 2012 | 4 | 3 |
| 2013 | 3 | 3 |
| 2014 | 1 | 4 |
| 2015 | 4 | 6 |
| 2016 | 2 | 1 |
| 2017 | 3 | 2 |
| 2018 | 3 | 1 |
| 2019 | 1 | 1 |
| 2020 | 1 | 1 |
| 2021 | 1 | 5 |
| 2022 | 1 | 0 |
| 2023 | 3 | 4 |
| 2024 | 3 | 5 |
| 2025 | 0 | 4 |
| 2026 | 4 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- End point determination by means of contrast gas29 Sep 2026US 12,748,347 B2Carl Zeiss SMT GmbH
- Method for particle beam-induced processing of a defect of a microlithographic photomask7 Jul 2026US 12,676,283 B2Carl Zeiss SMT GmbH
- Charged particle assessment tool, inspection method10 Feb 2026US 12,548,735 B2ASML Netherlands B. V.
- Method and apparatus for mask repair27 Jan 2026US 12,535,729 B2Carl Zeiss SMT GmbH
- Devices and methods for examining and/or processing an element for photolithography5 Nov 2024US 12,135,540 B2Carl Zeiss SMT GmbH
- Method and device for correcting an imaging error of a particle beam during sample processing23 Jul 2026US 2026/0213126 A1
- Method and apparatus for particle beam-induced etching of a defect of a microlithographic photomask16 Jul 2026US 2026/0202738 A1
- Method for particle beam-induced processing of a defect of a microlithographic photomask16 Jul 2026US 2026/0204510 A1Carl Zeiss SMT GmbH
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Focused Ion Beam System24 Jul 2025US 2025/0239433 A1JEOL Ltd.
Most cited
By later US patents
- Electron beam processing98US 6,753,538 B2FEI Company · 2004
- Gas delivery systems for particle beam processing95US 5,851,413 AMicrion Corporation · 1998
- Process and device for surface-modification by physico-chemical reactions of gases or vapors on surfaces, using highly-charged ions67US 5,645,897 A1997
- Pattern film repair using a focused particle beam system67US 6,042,738 AMicrion Corporation · 2000
- Method and apparatus for enhancing yield of secondary ions65US 6,414,307 B1FEI Company · 2002