Devices and methods for examining and/or processing an element for photolithography
AssigneeCarl Zeiss SMT GmbH
InventorsMichael Budach, Nicole Auth, Christian Rensing, Alexander Freytag, Christian Wojek
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Abstract
A device for examining and/or processing an element for photolithography with a beam of charged particles, the device including (a) means for acquiring measurement data while the element for photolithography is exposed to the beam of charged particles; and (b) means for predetermining a drift of the beam of charged particles relative to the element for photolithography with a trained machine learning model and/or a predictive filter. The trained machine learning model and/or the predictive filter use(s) at least the measurement data as input data.
Claims24
A device for examining and/or processing an element for photolithography with a beam of charged particles, comprising:
- a. means for acquiring measurement data while the element for photolithography is exposed to the beam of charged particles;
- b. means for predetermining a drift of the beam of charged particles relative to the element for photolithography with a trained machine learning model and/or a predictive filter, wherein the trained machine learning model and/or the predictive filter use(s) at least the measurement data as input data;
- and
- c. means for correcting at least one defect of the element for photolithography with the beam of charged particles and at least one precursor gas.
A method for examining and/or processing an element for photolithography with a beam of charged particles, the method comprising the following steps:
- a. acquiring measurement data while the element for photolithography is exposed to the beam of charged particles;
- b. predetermining at least one drift of the beam of charged particles relative to the element for photolithography with a trained machine learning model and/or a predictive filter, wherein the trained machine learning model and/or the predictive filter use(s) at least the measurement data as input data;
- and
- c. correcting at least one defect of the element for photolithography with the beam of charged particles and at least one precursor gas.
Dependencies are inferred from the claim text.