H01J 2237/3146
Ion beam bombardment sputtering
H01J2237/3146 (Ion beam bombardment sputtering) appears on 37 US grants and 44 published applications in this corpus.
Search patents in H01J- Granted patents
- 37
- Published applications
- 44
- Assignees
- 46
- Inventors
- 121
- Latest grant
- 4 Mar 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 2 |
| 2002 | 2 | 3 |
| 2003 | 1 | 1 |
| 2004 | 2 | 5 |
| 2005 | 4 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 2 |
| 2008 | 0 | 1 |
| 2009 | 1 | 7 |
| 2010 | 0 | 3 |
| 2011 | 1 | 0 |
| 2012 | 2 | 2 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 2 | 2 |
| 2016 | 1 | 4 |
| 2017 | 1 | 0 |
| 2018 | 1 | 0 |
| 2019 | 0 | 0 |
| 2020 | 1 | 3 |
| 2021 | 1 | 3 |
| 2022 | 2 | 1 |
| 2023 | 1 | 0 |
| 2024 | 1 | 3 |
| 2025 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Ion beam sputtering apparatus and method4 Mar 2025US 12,243,715 B2Institute of Geological and Nuclear Sciences
- Single beam plasma source10 Dec 2024US 12,165,829 B2Board of Trustees of Michigan State University
- Metal plating of grids for ion beam sputtering14 Feb 2023US 11,581,164 B2Excelitas Technologies Corp.
- Apparatus for depositing a substrate and deposition system having the same27 Dec 2022US 11,535,929 B2Samsung Electronics Co., Ltd.
- Ion source and method4 Jan 2022US 11,217,426 B2Von Ardenne Asset GmbH & Co. KG
- Ion beam sputtering apparatus and method5 Jun 2025US 2025/0183003 A1Institute of Geological and Nuclear Sciences
- Power polishing apparatuses and methods for in-situ finishing and coating of optical component23 May 2024US 2024/0167150 A1Edmund Optics, Inc.
- Substrate processing apparatus and method of processing substrate by using the same28 Mar 2024US 2024/0105425 A1Samsung Electronics Co., Ltd.
- Ion beam deposition apparatus and ion beam deposition method using the same29 Feb 2024US 2024/0071712 A1Samsung Electronics Co., Ltd.
- Single beam plasma source13 Jan 2022US 2022/0013324 A1Board of Trustees of Michigan State University
Most cited
By later US patents
- Mask for increased uniformity in ion beam deposition148US 8,308,921 B1Western Digital (Fremont), LLC · 2012
- Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system34US 6,086,727 AInternational Business Machines Corporation · 2000
- Emissive flat panel display with improved regenerative cathode26US 5,764,004 A1998
- Emissive flat panel display with improved regenerative cathode23US 5,697,827 A1997
- Multi-planar angulated sputtering target and method of use for filling openings22US 5,741,404 AMicron Technology, Inc. · 1998