Mask for increased uniformity in ion beam deposition
AssigneeWestern Digital (Fremont), LLC
InventorsHugh C. Hiner, Lijie Zhao, Hariharakeshava Hegde
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Abstract
A shaper mask for particle flux includes a central portion extending from a body of the shaper mask along a first axis to block at least a first portion of a particle flux through the shaper mask from a first direction. The mask also includes at least one off-axis portion. Each off-axis portions extends from the body of the shaper mask along a respective second axis different from the first axis. Each off-axis portion is shaped to block a respective second portion of the particle flux traveling through the shaper mask from a second direction different from the first direction.
Claims9
A shaper mask for particle flux, comprising:
- a body surrounding one or more openings, the body being in a first plane;
- a central portion extending inwardly from the body of the shaper mask along a first axis in the first plane to block at least a first portion of a particle flux through the shaper mask from a first direction;
- at least one off-axis portion, each of the at least one off-axis portions extending inwardly from the body of the shaper mask along a respective second axis in the first plane different from the first axis and each of the at least one off-axis portions shaped to block a respective second portion of the particle flux traveling through the shaper mask from a second direction different from the first direction.
Dependencies are inferred from the claim text.