H01J 2237/3142
Ion plating
H01J2237/3142 (Ion plating) appears on 73 US grants and 83 published applications in this corpus.
Search patents in H01J- Granted patents
- 73
- Published applications
- 83
- Assignees
- 80
- Inventors
- 220
- Latest grant
- 21 Oct 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 4 | 0 |
| 2001 | 5 | 3 |
| 2002 | 4 | 4 |
| 2003 | 1 | 2 |
| 2004 | 2 | 8 |
| 2005 | 5 | 2 |
| 2006 | 1 | 2 |
| 2007 | 0 | 3 |
| 2008 | 1 | 5 |
| 2009 | 5 | 10 |
| 2010 | 1 | 6 |
| 2011 | 1 | 2 |
| 2012 | 3 | 2 |
| 2013 | 2 | 2 |
| 2014 | 1 | 0 |
| 2015 | 3 | 4 |
| 2016 | 1 | 6 |
| 2017 | 2 | 2 |
| 2018 | 4 | 1 |
| 2019 | 2 | 0 |
| 2020 | 4 | 3 |
| 2021 | 1 | 5 |
| 2022 | 2 | 3 |
| 2023 | 3 | 1 |
| 2024 | 2 | 4 |
| 2025 | 3 | 1 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Apparatuses and methods for merging ion beams21 Oct 2025US 12,451,342 B2Purdue Research Foundation
- Ion production system with efficient ion collection19 Aug 2025US 12,391,568 B2SHINE Technologies, LLC
- Ion beam sputtering apparatus and method4 Mar 2025US 12,243,715 B2Institute of Geological and Nuclear Sciences
- Single beam plasma source10 Dec 2024US 12,165,829 B2Board of Trustees of Michigan State University
- Apparatus and techniques for substrate processing using independent ion source and radical source28 May 2024US 11,996,266 B2APPLIED Materials.Inc.
- Apparatus and techniques for substrate processing using independent ion source and radical source13 Aug 2026US 2026/0237601 A1APPLIED Materials.Inc.
- Apparatuses and methods for merging ion beams22 Jan 2026US 2026/0024737 A1Purdue Reserch Foundation
- Ion beam sputtering apparatus and method5 Jun 2025US 2025/0183003 A1Institute of Geological and Nuclear Sciences
- Apparatus and techniques for substrate processing using independent ion source and radical source5 Sep 2024US 2024/0297016 A1APPLIED Materials.Inc.
- Power polishing apparatuses and methods for in-situ finishing and coating of optical component23 May 2024US 2024/0167150 A1Edmund Optics, Inc.
Most cited
By later US patents
- Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same425US 7,799,706 B2Sungkyunkwan University Foundation for Corporate Collaboration · 2010
- Mask for increased uniformity in ion beam deposition148US 8,308,921 B1Western Digital (Fremont), LLC · 2012
- Filtered cathodic arc source68US 5,279,723 Aas represented by the United States Department of Energy · 1994
- Ion source based on the cathodic arc34US 5,282,944 AThe United States of America as represented by the United States Department of Energy · 1994
- Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system34US 6,086,727 AInternational Business Machines Corporation · 2000