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US 12,165,829 B2Granted
Single beam plasma source
AssigneeBoard of Trustees of Michigan State University
InventorQi Hua Fan
Life of this patent
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Abstract
A single beam plasma or ion source apparatus, including multiple and different power sources, is provided. An aspect of the present apparatus and method employs simultaneous excitation of an ion source by DC and AC, or DC and RF power supplies. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape.
Claims30
A plasma apparatus comprising an ion source apparatus, the ion source comprising:
- (a) an anode comprising at least one magnetic conductor and an open plasma area being located within a hollow central area of the anode;
- (b) a cathode comprising a cap having an outlet opening therethrough, the cathode further comprising a nonmagnetic body surrounding the magnetic conductor internally located within and spaced away from the body;
- (c) a direct current power source connected to the anode;
- (d) a radio frequency power source connected to the anode;
- and
- (e) ionization operably occurring within the plasma area inside the anode at least partially due to excitation by the direct current and radio frequency power sources.
3 more elements
A plasma apparatus comprising an ion source apparatus, the ion source comprising:
- (a) an anode comprising at least one magnetic conductor and an open plasma area being located within a hollow central area of the anode;
- (b) a cathode comprising a cap having an outlet opening;
- (c) a direct current power source connected to the anode, direct current power from the source being 10-300 volts;
- (d) an alternating current or radio frequency power source connected to the anode;
- (e) a vacuum chamber within which the anode and the cathode are located;
- (f) a sputter deposition source located within the vacuum chamber;
- and
- (g) a single ion beam emitted from the outlet opening of the cathode containing ions being substantially uniformly distributed around a center axis viewed in cross-section.
5 more elements
A method of using an ion source, the method comprising:
- (a) supplying direct current electricity to an anode, which includes a magnet;
- (b) supplying at least one of:
- alternating electricity and a radio frequency, to the anode simultaneous with step (a);
- (c) setting a cathode, surrounding a portion of the anode, to a floating, ground or bias potential, the cathode including an outlet opening;
- and
- (d) ionizing reactive gas within a vacuum, due at least in part to steps (a) and (b), to emit a single and stable ion beam, without a hollow center, out of the outlet opening.
3 more elements
An ion source apparatus comprising:
- (a) an anode comprising at least one magnetic conductor and an open plasma area being located within the anode;
- (b) a cathode comprising a cap having an outlet opening therethough;
- (c) a direct current power source connected to the anode;
- (d) an alternating current or radio frequency power source connected to the anode;
- (e) ionization operably occurring within the plasma area inside the anode at least partially due to excitation by the direct and alternating current power sources;
- (f) the cap of the cathode being magnetic and removable;
- (g) the cap being isolated from a body of the anode which surrounds the at least one magnetic conductor of the anode;
- and
- (h) an ion source discharge voltage being between 1-10 volts.
6 more elements
A plasma apparatus comprising an ion source apparatus, the ion source comprising:
- (a) an anode comprising at least one magnetic conductor and an open plasma area being located within the anode;
- (b) a cathode comprising a cap having an outlet opening;
- (c) a direct current power source connected to the anode;
- (d) an alternating current or radio frequency power source connected to the anode;
- (e) ionization operably occurring within the plasma area inside the anode at least partially due to excitation by the direct and alternating current power sources;
- (f) a first insulator located adjacent to a middle segment of a body of the anode laterally defining part of the open plasma area opposite the outlet opening of the anode, a peripheral edge of the first insulator having a lateral dimension at or less than innermost edges of the magnetic conductor of the anode;
- (g) the magnetic conductor being at least one of magnets or magnetic shunts;
- and
- (h) at least a second insulator, having a hollow center and being longitudinally spaced away from the first insulator, and a lateral periphery of the second insulator having a greater dimension than the lateral dimension of the first insulator.
6 more elements
Dependencies are inferred from the claim text.