Ion beam deposition apparatus and ion beam deposition method using the same

An ion beam deposition method, comprising:

• placing a substrate onto a substrate holder;
• irradiating an ion beam toward a target plate spaced apart from the substrate holder;
• and
• rotating the substrate during the irradiating the ion beam toward the target plate,
• wherein the target plate includes a first region;
• and a second region that does not overlap the first region, and wherein the first region comprises a material different from a material of the second region.

An ion beam deposition apparatus, comprising:

• an ion beam source;
• a target part spaced apart from the ion beam source;
• and
• a substrate holder spaced apart from each of the ion beam source and the target part,
• wherein the target part comprises a target plate and a target holder that supports the target plate,
• wherein the target plate comprises a plurality of first regions each comprising a first material and a plurality of second regions each comprising a second material different from the first material, and
• wherein each of the plurality of first regions and each of the plurality of second regions are alternately disposed in a circumferential direction.