H01J 2237/0822
Multiple sources
H01J2237/0822 (Multiple sources) appears on 111 US grants and 115 published applications in this corpus.
Search patents in H01J- Granted patents
- 111
- Published applications
- 115
- Assignees
- 52
- Inventors
- 266
- Latest grant
- 29 Apr 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 3 | 2 |
| 2002 | 1 | 1 |
| 2003 | 1 | 0 |
| 2004 | 2 | 3 |
| 2005 | 2 | 0 |
| 2006 | 1 | 3 |
| 2007 | 0 | 4 |
| 2008 | 3 | 5 |
| 2009 | 2 | 11 |
| 2010 | 6 | 9 |
| 2011 | 8 | 5 |
| 2012 | 7 | 7 |
| 2013 | 7 | 9 |
| 2014 | 7 | 7 |
| 2015 | 13 | 6 |
| 2016 | 5 | 9 |
| 2017 | 5 | 3 |
| 2018 | 4 | 6 |
| 2019 | 6 | 2 |
| 2020 | 5 | 4 |
| 2021 | 2 | 4 |
| 2022 | 3 | 3 |
| 2023 | 2 | 7 |
| 2024 | 7 | 0 |
| 2025 | 2 | 4 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Particle beam device having a deflection unit29 Apr 2025US 12,288,664 B2Carl Zeiss Microscopy GmbH
- Broad ion beam (BIB) systems for more efficient processing of multiple samples18 Feb 2025US 12,228,484 B2FEI Company
- System and methods for automated processing of multiple samples in a BIB system10 Dec 2024US 12,165,833 B2FEI Company
- Automated ion-beam alignment for dual-beam instrument26 Nov 2024US 12,154,757 B2FEI Company
- Ion beam device19 Nov 2024US 12,148,593 B2Hitachi High-Tech Corporation
- Non-uniform subsrate processing using a scanned spot ion beam10 Sep 2026US 2026/0269168 A1APPLIED Materials.Inc.
- Broad ion beam (bib) systems for more efficient processing of multiple samples16 Oct 2025US 2025/0321164 A1FEI Company
- Systems and methods for high-throughput angled ion processing11 Sep 2025US 2025/0285843 A1APPLIED Materials.Inc.
- Adjustable multiple filament ion beam deposition system13 Mar 2025US 2025/0087441 A1
- Ion implantation method and ion implanter9 Jan 2025US 2025/0014860 A1Sumitomo Heavy Industries Ion Technology Co., Ltd.
Most cited
By later US patents
- Ion source having auxillary ion chamber423US 5,107,170 ANissin Electric Co., Ltd. · 1992
- Beam processing apparatus350US 6,849,857 B2Ebara Corporation · 2005
- Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample88US 8,779,400 B2Hitachi High-Technologies Corporation · 2014
- Fabrication of silicon-on-insulator structure using plasma immersion ion implantation71US 6,893,907 B2APPLIED Materials.Inc. · 2005
- Use of chained implants in solar cells39US 7,727,866 B2Varian Semiconductor Equipment Associates, Inc. · 2010