Broad ion beam (BIB) systems for more efficient processing of multiple samples
AssigneeFEI Company
InventorsMichal Hrouzek, Krishna Kanth Neelisetty, Petr Wandrol, Libor Novak
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Abstract
Systems and methods for operating a broad ion beam (BIB) polisher in a sample preparation workflow having improved uptime, are disclosed. An example method for operating a broad ion beam (BIB) polisher having improved uptime according to the present invention comprises causing a first BIB source to emit a first broad ion beam towards a sample positioned within an interior volume of the BIB polisher while the first BIB source is in emitting the first broad ion beam towards the sample, removing a second BIB source from the BIB polisher that is configured to emit a second broad ion beam towards the sample when in use.
Claims19
A broad ion beam (BIB) sample preparation system having improved uptime, the BIB sample preparation system comprising:
- a housing defining an interior volume;
- a sample stage positioned within the interior volume, wherein the sample stage is configured to hold a sample holder during polishing of a sample held by the sample holder;
- a first BIB source configured to emit a first broad ion beam towards the sample when in use, wherein the first BIB source is positioned within a first source housing;
- and
- a second BIB source configured to emit a second broad ion beam towards the sample when in use, wherein the second BIB source is positioned within a second source housing, wherein the second BIB source is configured to be removed while the first BIB source is emitting the first broad ion beam toward the sample.
A method for operating a broad ion beam (BIB) polisher having improved uptime, the method comprising:
- causing a first BIB source to emit a first broad ion beam towards a sample positioned within an interior volume of the BIB polisher, wherein the first broad ion beam causes a portion of the sample upon which it is incident to be removed;
- removing, while the first BIB source is in emitting the first broad ion beam towards the sample, a second BIB source from the BIB polisher, wherein the second BIB source is configured to emit a second broad ion beam towards the sample when the second BIB source 1 s muse.
Dependencies are inferred from the claim text.