H01J 2237/0827
For producing different ions sequentially
Official title: for producing different ions sequentially
H01J2237/0827 (For producing different ions sequentially) appears on 60 US grants and 63 published applications in this corpus.
Search patents in H01J- Granted patents
- 60
- Published applications
- 63
- Assignees
- 30
- Inventors
- 122
- Latest grant
- 19 Nov 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 0 |
| 2006 | 0 | 2 |
| 2007 | 0 | 2 |
| 2008 | 2 | 4 |
| 2009 | 1 | 9 |
| 2010 | 5 | 7 |
| 2011 | 5 | 3 |
| 2012 | 6 | 5 |
| 2013 | 3 | 5 |
| 2014 | 7 | 6 |
| 2015 | 10 | 4 |
| 2016 | 2 | 2 |
| 2017 | 3 | 2 |
| 2018 | 2 | 3 |
| 2019 | 2 | 1 |
| 2020 | 2 | 2 |
| 2021 | 2 | 2 |
| 2022 | 2 | 2 |
| 2023 | 1 | 0 |
| 2024 | 1 | 0 |
| 2025 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Ion beam device19 Nov 2024US 12,148,593 B2Hitachi High-Tech Corporation
- Systems and methods for additive manufacturing for the deposition of metal and ceramic materials14 Mar 2023US 11,603,589 B2Arizona Thin Film Research, LLC
- Insertable target holder for solid dopant materials2 Aug 2022US 11,404,254 B2Varian Semiconductor Equipment Associates, Inc.
- Multi-source ion beam etch system12 Jul 2022US 11,387,071 B2APPLIED Materials.Inc.
- Multiple arc chamber source23 Nov 2021US 11,183,365 B2Axcelis Technologies, Inc.
- Ion implantation method and ion implanter9 Jan 2025US 2025/0014860 A1Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Ion beam device22 Sep 2022US 2022/0301812 A1Hitachi High-Tech Corporation
- Method of manufacturing semiconductor device, method of manufacturing stacked wiring structure, and ion beam irradiation apparatus8 Sep 2022US 2022/0285170 A1Kioxia Corporation
- Systems and methods for additive manufacturing for the deposition of metal and ceramic materials17 Jun 2021US 2021/0180179 A1Arizona Thin Film Research, LLC
- Multi-source ion beam etch system8 Apr 2021US 2021/0104374 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Beam processing apparatus350US 6,849,857 B2Ebara Corporation · 2005
- Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample88US 8,779,400 B2Hitachi High-Technologies Corporation · 2014
- Use of chained implants in solar cells39US 7,727,866 B2Varian Semiconductor Equipment Associates, Inc. · 2010
- Multi-source plasma focused ion beam system34US 8,076,650 B2FEI Company · 2011
- Multi-source plasma focused ion beam system26US 8,405,054 B2FEI Company · 2013