H01J 2237/0825
For producing different ions simultaneously
Official title: for producing different ions simultaneously
H01J2237/0825 (For producing different ions simultaneously) appears on 27 US grants and 27 published applications in this corpus.
Search patents in H01J- Granted patents
- 27
- Published applications
- 27
- Assignees
- 17
- Inventors
- 70
- Latest grant
- 26 Nov 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 1 |
| 2003 | 0 | 0 |
| 2004 | 1 | 1 |
| 2005 | 1 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 0 |
| 2008 | 1 | 1 |
| 2009 | 0 | 2 |
| 2010 | 1 | 4 |
| 2011 | 1 | 2 |
| 2012 | 4 | 2 |
| 2013 | 4 | 4 |
| 2014 | 1 | 0 |
| 2015 | 4 | 2 |
| 2016 | 1 | 1 |
| 2017 | 1 | 1 |
| 2018 | 0 | 1 |
| 2019 | 2 | 1 |
| 2020 | 1 | 0 |
| 2021 | 0 | 1 |
| 2022 | 0 | 0 |
| 2023 | 1 | 1 |
| 2024 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Automated ion-beam alignment for dual-beam instrument26 Nov 2024US 12,154,757 B2FEI Company
- Systems and methods for additive manufacturing for the deposition of metal and ceramic materials14 Mar 2023US 11,603,589 B2Arizona Thin Film Research, LLC
- Ion beam treatment apparatus31 Mar 2020US 10,603,517 B2Electronics and Telecommunications Research Institute
- Deposition tool for combinatorial thin film material libraries30 Jul 2019US 10,363,537 B2Universiteit Gent
- Positive and negative ion source based on radio-frequency inductively coupled discharge12 Feb 2019US 10,204,758 B1Dalian University of Technology
- Automated ion-beam alignment for dual-beam instrument23 Nov 2023US 2023/0377830 A1FEI Company
- Systems and methods for additive manufacturing for the deposition of metal and ceramic materials17 Jun 2021US 2021/0180179 A1Arizona Thin Film Research, LLC
- Positive and negative ion source based on radio-frequency inductively coupled discharge14 Feb 2019US 2019/0051486 A1Dalian University of Technology
- Ion beam treatment apparatus20 Dec 2018US 2018/0361173 A1Electronics and Telecommunications Research Institute
- Covering material stripping method and stripping device using ion irradiation20 Jul 2017US 2017/0207065 A1Shinmaywa Industries, Ltd.
Most cited
By later US patents
- Ion source having auxillary ion chamber423US 5,107,170 ANissin Electric Co., Ltd. · 1992
- Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample88US 8,779,400 B2Hitachi High-Technologies Corporation · 2014
- Fabrication of silicon-on-insulator structure using plasma immersion ion implantation71US 6,893,907 B2APPLIED Materials.Inc. · 2005
- Multiple-beam ion-beam assembly20US 6,236,163 B12001
- Through-the-lens neutralization for charged particle beam system17US 6,683,320 B2FEI Company · 2004