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OwnerYuri Maishev, James Ritter +3inventors
InventorsYuri Maishev, James Ritter, Yuri Terentiev, Leonid Velikov, Alexander Shkolnik
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A multiple-beam ion-beam assembly consisting of two or more concentrically arranged ring-shaped ion-beam sources having ion-beam slits that emit a plurality of ion beams which overlap on the surface being treated and thus ensure uniformity in distribution of ion currents on the treated surface. Since the ion-beam assembly consists of a plurality of individual source, uniform treatment can be performed on a large surface area. Several embodiments of the invention cover the systems with individual sources adjustable with respect to one another, with an oblique angle of incidence of beams emitted from individual source, and with combination of oblique angles and adjustable sources.
An ion-beam source assembly comprising at least two concentric ion-beam sources, one of which is an outer ion-beam source and another is an inner ion-beam source, each said ion-beam source having an individual anode, gas supply system, and an ion-emitting slit of a closed-loop configuration.
A method for treating an object with a plurality of ion beams having a closed-loop cross-section in the direction perpendicular to the direction of propagation of said ion beams, comprising:
An ion-beam source assembly comprising:
Dependencies are inferred from the claim text.